epigenetic programing of male pronucleus / methylcytosine dioxygenase / DNA 5-methylcytosine dioxygenase activity / TET1,2,3 and TDG demethylate DNA / chromosomal 5-methylcytosine DNA demethylation, oxidation pathway / positive regulation of gene expression via chromosomal CpG island demethylation / protein O-linked glycosylation / male pronucleus / female pronucleus / methyl-CpG binding ...epigenetic programing of male pronucleus / methylcytosine dioxygenase / DNA 5-methylcytosine dioxygenase activity / TET1,2,3 and TDG demethylate DNA / chromosomal 5-methylcytosine DNA demethylation, oxidation pathway / positive regulation of gene expression via chromosomal CpG island demethylation / protein O-linked glycosylation / male pronucleus / female pronucleus / methyl-CpG binding / Chromatin modifications during the maternal to zygotic transition (MZT) / chromosome / RNA polymerase II cis-regulatory region sequence-specific DNA binding / positive regulation of transcription by RNA polymerase II / zinc ion binding / nucleus / cytoplasm 類似検索 - 分子機能
Methylcytosine dioxygenase TET1/2/3 / : / Oxygenase domain of the 2OGFeDO superfamily / 2OGFeDO, oxygenase domain / Oxygenase domain of the 2OGFeDO superfamily / CXXC zinc finger domain / Zinc finger, CXXC-type / Zinc finger CXXC-type profile. 類似検索 - ドメイン・相同性
DNA / DNA (> 10) / Methylcytosine dioxygenase TET3 / Methylcytosine dioxygenase TET3 類似検索 - 構成要素
解像度: 1.57→39.11 Å / Cor.coef. Fo:Fc: 0.954 / Cor.coef. Fo:Fc free: 0.932 / WRfactor Rfree: 0.2466 / WRfactor Rwork: 0.2132 / FOM work R set: 0.7594 / SU B: 6.238 / SU ML: 0.095 / SU R Cruickshank DPI: 0.097 / SU Rfree: 0.0994 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.097 / ESU R Free: 0.099 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: the structure was by molecular replacement using diffraction data collected on an isomorphous sanple. coot was used for interactive model building. Model geometry was assessed with phenix.molprobity.
Rfactor
反射数
%反射
Selection details
Rfree
0.2525
807
5 %
RANDOM
Rwork
0.2146
15494
-
-
obs
0.2164
16301
99.62 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK