- PDB-5dlm: Complex of Influenza M2e and Antibody -
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IDまたはキーワード:
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基本情報
登録情報
データベース: PDB / ID: 5dlm
タイトル
Complex of Influenza M2e and Antibody
要素
Heavy chain of monoclonal antibody
Light chain of monoclonal antibody
Matrix protein 2
キーワード
IMMUNE SYSTEM / Complex / Antibody / Extracellular domain
機能・相同性
機能・相同性情報
uncoating of virus / Transport of HA trimer, NA tetramer and M2 tetramer from the endoplasmic reticulum to the Golgi Apparatus / Assembly of Viral Components at the Budding Site / Influenza Infection / Fusion of the Influenza Virion to the Host Cell Endosome / Release / Budding / Packaging of Eight RNA Segments / Uncoating of the Influenza Virion / Entry of Influenza Virion into Host Cell via Endocytosis ...uncoating of virus / Transport of HA trimer, NA tetramer and M2 tetramer from the endoplasmic reticulum to the Golgi Apparatus / Assembly of Viral Components at the Budding Site / Influenza Infection / Fusion of the Influenza Virion to the Host Cell Endosome / Release / Budding / Packaging of Eight RNA Segments / Uncoating of the Influenza Virion / Entry of Influenza Virion into Host Cell via Endocytosis / suppression by virus of host autophagy / protein complex oligomerization / monoatomic ion channel activity / proton transmembrane transporter activity / Viral mRNA Translation / symbiont genome entry into host cell via pore formation in plasma membrane / host cell plasma membrane / virion membrane / extracellular region / membrane / plasma membrane 類似検索 - 分子機能
H: Heavy chain of monoclonal antibody L: Light chain of monoclonal antibody I: Heavy chain of monoclonal antibody M: Light chain of monoclonal antibody X: Matrix protein 2 Y: Matrix protein 2 ヘテロ分子
解像度: 2.2→49.21 Å / Cor.coef. Fo:Fc: 0.958 / Cor.coef. Fo:Fc free: 0.934 / SU B: 13.277 / SU ML: 0.161 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.254 / ESU R Free: 0.208 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.2403
2494
5 %
RANDOM
Rwork
0.1866
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-
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obs
0.1893
47639
98.05 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK