マシュー密度: 5.6 Å3/Da / 溶媒含有率: 77.8 % / 解説: STARTING MODEL WAS STRIPPED OF HETATMS.
結晶化
温度: 277 K / 手法: 蒸気拡散法, シッティングドロップ法 / pH: 7.5 詳細: SITTING DROP VAPOUR DIFFUSION AT 4C. 2 UL 17 MG/ML APPRO PLUS 2 UL RESERVOIR SOLUTION: 30% MPD, 0.1 M CITRATE PH 7.5, 0.2 M MGACETATE. SOAKED IN RESERVOIR SOLUTION SUPPLEMENTED WITH 1 MM ...詳細: SITTING DROP VAPOUR DIFFUSION AT 4C. 2 UL 17 MG/ML APPRO PLUS 2 UL RESERVOIR SOLUTION: 30% MPD, 0.1 M CITRATE PH 7.5, 0.2 M MGACETATE. SOAKED IN RESERVOIR SOLUTION SUPPLEMENTED WITH 1 MM MNCL2 FOR 45 MIN AT 4C PRIOR TO CRYOCOOLING.
解像度: 2.4→119.52 Å / Cor.coef. Fo:Fc: 0.961 / Cor.coef. Fo:Fc free: 0.944 / SU B: 9.624 / SU ML: 0.113 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.167 / ESU R Free: 0.159 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. INSUFFICIENT DENSITY WAS PRESENT FOR COMPLETE MODELLING OF RESIDUES 439-440
Rfactor
反射数
%反射
Selection details
Rfree
0.207
2026
4.9 %
RANDOM
Rwork
0.172
-
-
-
obs
0.174
39342
93.5 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK