- PDB-4ydx: Crystal structure of cisplatin bound to a human copper chaperone ... -
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基本情報
登録情報
データベース: PDB / ID: 4ydx
タイトル
Crystal structure of cisplatin bound to a human copper chaperone (monomer) - new refinement
要素
Copper transport protein ATOX1
キーワード
METAL TRANSPORT / Re-refinement of 3iwl / cisplatin / platinum / Metal-binding
機能・相同性
機能・相同性情報
metallochaperone activity / Ion influx/efflux at host-pathogen interface / copper-dependent protein binding / copper chaperone activity / copper ion transport / Detoxification of Reactive Oxygen Species / cuprous ion binding / intracellular copper ion homeostasis / response to oxidative stress / copper ion binding / cytosol 類似検索 - 分子機能
解像度: 1.602→27.03 Å / Cor.coef. Fo:Fc: 0.976 / Cor.coef. Fo:Fc free: 0.97 / WRfactor Rfree: 0.1805 / WRfactor Rwork: 0.1549 / FOM work R set: 0.9153 / SU B: 2.348 / SU ML: 0.039 / SU R Cruickshank DPI: 0.0574 / SU Rfree: 0.0582 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.057 / ESU R Free: 0.058 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: U VALUES : WITH TLS ADDED HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. This deposit resulted from an analysis of a number of PDB entries that contain cisplatin or carboplatin in complex ...詳細: U VALUES : WITH TLS ADDED HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. This deposit resulted from an analysis of a number of PDB entries that contain cisplatin or carboplatin in complex with proteins, conducted in the spirit of the Terwilliger-Bricogne motto advocating continuous improvement of the macromolecular models in the PDB (Acta Cryst. D70, 2533, 2014). The structure factors and coordinates, originally deposited as 3iwl (Boal, A. K. & Rosenzweig, A. C. 2009. J. Am. Chem. Soc. 131, 14196-14197), were used as the starting point for an independent re-refinement. The new model includes some reinterpretation of the ligands, has lower R factors, and improved statistics describing the agreement with the experimental data.
Rfactor
反射数
%反射
Selection details
Rfree
0.1555
621
4.9 %
RANDOM
Rwork
0.136
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obs
0.1369
12057
99.54 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK