- PDB-2wlj: Potassium channel from Magnetospirillum magnetotacticum -
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IDまたはキーワード:
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基本情報
登録情報
データベース: PDB / ID: 2wlj
タイトル
Potassium channel from Magnetospirillum magnetotacticum
要素
POTASSIUM CHANNEL
キーワード
METAL TRANSPORT
機能・相同性
機能・相同性情報
regulation of monoatomic ion transmembrane transport / inward rectifier potassium channel activity / potassium ion import across plasma membrane / monoatomic ion channel complex / identical protein binding / plasma membrane 類似検索 - 分子機能
Group: Atomic model / Database references ...Atomic model / Database references / Non-polymer description / Other / Refinement description / Version format compliance
THIS ENTRY 2WLJ REFLECTS AN ALTERNATIVE MODELING OF THE ORIGINAL STRUCTURAL DATA (R1XL4SF) ...THIS ENTRY 2WLJ REFLECTS AN ALTERNATIVE MODELING OF THE ORIGINAL STRUCTURAL DATA (R1XL4SF) DETERMINED BY AUTHORS OF THE PDB ENTRY 1XL4: J.M.GULBIS,A.KUO,B.SMITH,D.A.DOYLE,A.EDWARDS,C.ARROWSMITH, M.SUNDSTROM
Remark 700
SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN ... SHEET THE SHEET STRUCTURE OF THIS MOLECULE IS BIFURCATED. IN ORDER TO REPRESENT THIS FEATURE IN THE SHEET RECORDS BELOW, TWO SHEETS ARE DEFINED.
解像度: 2.6→15 Å / Cor.coef. Fo:Fc: 0.931 / Cor.coef. Fo:Fc free: 0.928 / SU B: 17.526 / SU ML: 0.179 / 交差検証法: THROUGHOUT / ESU R: 0.42 / ESU R Free: 0.27 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. ATOM RECORD CONTAINS RESIDUAL B FACTORS ONLY. THIS ENTRY IS A RE-REFINEMENT OF PDB ENTRY 1XL4. IMPROVED REFINEMENT STATISTICS WERE OBTAINED ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. ATOM RECORD CONTAINS RESIDUAL B FACTORS ONLY. THIS ENTRY IS A RE-REFINEMENT OF PDB ENTRY 1XL4. IMPROVED REFINEMENT STATISTICS WERE OBTAINED AND AN ADDITIONAL LIGAND (SPERMINE) MODELLED. STRUCTURE WAS INITIALLY REFINED IN PHENIX, THEN TRANSFERRED TO REFMAC. ANY ANISOTROPIC THERMAL PARAMETERS WERE CALCULATED BY PHENIX FROM THE TLS PARAMETERS, AND WERE NOT REFINED EXPLICITLY.
Rfactor
反射数
%反射
Selection details
Rfree
0.24331
1525
5.2 %
RANDOM
Rwork
0.22028
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obs
0.22148
27897
91.58 %
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溶媒の処理
イオンプローブ半径: 1 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK