9U3O
Crystal structure of Chi430 mutant E176A in the substrate complex
Experimental procedure
Experimental method | SINGLE WAVELENGTH |
Source type | SYNCHROTRON |
Source details | SSRF BEAMLINE BL10U2 |
Synchrotron site | SSRF |
Beamline | BL10U2 |
Temperature [K] | 100 |
Detector technology | PIXEL |
Collection date | 2025-01-03 |
Detector | DECTRIS EIGER X 16M |
Wavelength(s) | 0.97918 |
Spacegroup name | C 1 2 1 |
Unit cell lengths | 121.676, 49.858, 92.602 |
Unit cell angles | 90.00, 125.62, 90.00 |
Refinement procedure
Resolution | 49.506 - 1.350 |
Rwork | 0.184 |
R-free | 0.20330 |
Structure solution method | MOLECULAR REPLACEMENT |
RMSD bond length | 0.012 |
RMSD bond angle | 1.959 |
Data reduction software | DIALS |
Data scaling software | Aimless |
Phasing software | PHENIX |
Refinement software | REFMAC (5.8.0430) |
Data quality characteristics
Overall | Outer shell | |
Low resolution limit [Å] | 60.580 | 1.390 |
High resolution limit [Å] | 1.350 | 1.350 |
Number of reflections | 98938 | 7195 |
<I/σ(I)> | 7.4 | 2.5 |
Completeness [%] | 99.8 | |
Redundancy | 6 | 4.4 |
CC(1/2) | 0.974 | 0.189 |
Crystallization Conditions
crystal ID | method | pH | temperature | details |
1 | VAPOR DIFFUSION, SITTING DROP | 4.5 | 290 | 0.1 M BIS-TRIS pH 5.5, 2.0 M Ammonium sulfate |