8F4H
RT XFEL structure of Photosystem II 1200 microseconds after the third illumination at 2.10 Angstrom resolution
Experimental procedure
Experimental method | SINGLE WAVELENGTH |
Source type | FREE ELECTRON LASER |
Source details | SLAC LCLS BEAMLINE MFX |
Synchrotron site | SLAC LCLS |
Beamline | MFX |
Temperature [K] | 298 |
Detector technology | CCD |
Collection date | 2020-12-04 |
Detector | RAYONIX MX340-HS |
Wavelength(s) | 1.302 |
Spacegroup name | P 21 21 21 |
Unit cell lengths | 117.558, 223.174, 310.261 |
Unit cell angles | 90.00, 90.00, 90.00 |
Refinement procedure
Resolution | 29.480 - 2.100 |
R-factor | 0.1881 |
Rwork | 0.188 |
R-free | 0.23240 |
Structure solution method | MOLECULAR REPLACEMENT |
Starting model (for MR) | 7rf1 |
RMSD bond length | 0.009 |
RMSD bond angle | 1.166 |
Data reduction software | cctbx.xfel |
Data scaling software | cctbx.xfel.merge |
Phasing software | PHASER |
Refinement software | PHENIX (1.19.2_4158) |
Data quality characteristics
Overall | Outer shell | |
Low resolution limit [Å] | 29.480 | 2.140 |
High resolution limit [Å] | 2.100 | 2.100 |
Number of reflections | 471242 | 23117 |
<I/σ(I)> | 3.54 | 0.34 |
Completeness [%] | 99.9 | |
Redundancy | 99 | 8.1 |
CC(1/2) | 0.988 | 0.070 |
Crystallization Conditions
crystal ID | method | pH | temperature | details |
1 | BATCH MODE | 6.5 | 298 | 0.1 M MES pH 6.5, 0.1 M NH4Cl, 35% (w/v) PEG 5000 |