4XUX
Structure of ampC bound to RPX-7009 at 1.75 A
Experimental procedure
Experimental method | SINGLE WAVELENGTH |
Source type | SYNCHROTRON |
Source details | ALS BEAMLINE 5.0.3 |
Synchrotron site | ALS |
Beamline | 5.0.3 |
Temperature [K] | 100 |
Detector technology | CCD |
Collection date | 2011-11-13 |
Detector | ADSC QUANTUM 210 |
Spacegroup name | P 2 21 21 |
Unit cell lengths | 62.560, 69.600, 76.330 |
Unit cell angles | 90.00, 90.00, 90.00 |
Refinement procedure
Resolution | 50.000 - 1.750 |
R-factor | 0.156 |
Rwork | 0.154 |
R-free | 0.18600 |
Structure solution method | MOLECULAR REPLACEMENT |
Starting model (for MR) | 1xx2 |
RMSD bond length | 0.010 |
RMSD bond angle | 1.572 |
Data reduction software | XDS |
Data scaling software | XSCALE |
Phasing software | PHASER (2.3.0) |
Refinement software | REFMAC (5.6.0117) |
Data quality characteristics
Overall | Outer shell | |
Low resolution limit [Å] | 50.000 | 1.800 |
High resolution limit [Å] | 1.750 | 1.750 |
Rmerge | 0.095 | 0.464 |
Number of reflections | 34340 | |
<I/σ(I)> | 20 | 4.5 |
Completeness [%] | 100.0 | 100 |
Redundancy | 7.9 | 7.3 |
Crystallization Conditions
crystal ID | method | pH | temperature | details |
1 | VAPOR DIFFUSION, SITTING DROP | 7 | 289 | 30mg/ml AmpC, 30% PEG3000, 0.1M TRIS, PH 7.0, 0.2M NACL, VAPOR DIFFUSION, SITTING DROP, TEMPERATURE 298K |