4GRM
The crystal structure of the high affinity TCR A6
Experimental procedure
| Experimental method | SINGLE WAVELENGTH |
| Source type | SYNCHROTRON |
| Source details | APS BEAMLINE 19-ID |
| Synchrotron site | APS |
| Beamline | 19-ID |
| Temperature [K] | 100 |
| Detector technology | CCD |
| Collection date | 2009-10-21 |
| Detector | CUSTOM-MADE |
| Wavelength(s) | 0.97929 |
| Spacegroup name | P 1 21 1 |
| Unit cell lengths | 90.491, 51.969, 95.218 |
| Unit cell angles | 90.00, 104.94, 90.00 |
Refinement procedure
| Resolution | 18.840 - 2.000 |
| R-factor | 0.23745 |
| Rwork | 0.234 |
| R-free | 0.29495 |
| Structure solution method | MOLECULAR REPLACEMENT |
| RMSD bond length | 0.017 |
| RMSD bond angle | 1.852 |
| Data reduction software | HKL-2000 |
| Data scaling software | HKL-2000 |
| Phasing software | MOLREP |
| Refinement software | REFMAC (5.6.0117) |
Data quality characteristics
| Overall | Outer shell | |
| Low resolution limit [Å] | 20.000 | 2.030 |
| High resolution limit [Å] | 2.000 | 2.000 |
| Rmerge | 0.070 | 0.686 |
| Number of reflections | 57468 | |
| <I/σ(I)> | 24 | 2.12 |
| Completeness [%] | 98.9 | 98.7 |
| Redundancy | 3.8 | 3.8 |
Crystallization Conditions
| crystal ID | method | pH | temperature | details |
| 1 | VAPOR DIFFUSION, SITTING DROP | 8.5 | 297 | 30% PEG, 0.1 M TRIS, pH 8.5, VAPOR DIFFUSION, SITTING DROP, temperature 297K |
