3SJ5
I5F Mutant Structure of T. Tengcongensis H-NOX
Experimental procedure
| Experimental method | SINGLE WAVELENGTH |
| Source type | SYNCHROTRON |
| Source details | ALS BEAMLINE 5.0.1 |
| Synchrotron site | ALS |
| Beamline | 5.0.1 |
| Temperature [K] | 100 |
| Wavelength(s) | 0.977408 |
| Spacegroup name | P 1 21 1 |
| Unit cell lengths | 44.585, 67.116, 66.428 |
| Unit cell angles | 90.00, 92.01, 90.00 |
Refinement procedure
| Resolution | 47.198 - 1.673 |
| R-factor | 0.1999 |
| Rwork | 0.197 |
| R-free | 0.24710 |
| Structure solution method | MOLECULAR REPLACEMENT |
| RMSD bond length | 0.007 |
| RMSD bond angle | 0.992 |
| Data reduction software | HKL-2000 |
| Data scaling software | HKL-2000 |
| Phasing software | PHASER |
| Refinement software | PHENIX ((phenix.refine: 1.7_650)) |
Data quality characteristics
| Overall | Outer shell | |
| Low resolution limit [Å] | 50.000 | 1.700 |
| High resolution limit [Å] | 1.670 | 1.670 |
| Number of reflections | 45085 | |
| <I/σ(I)> | 31.1 | 2.2 |
| Completeness [%] | 100.0 | 99.9 |
| Redundancy | 3.7 | 3.5 |
Crystallization Conditions
| crystal ID | method | pH | temperature | details |
| 1 | VAPOR DIFFUSION, SITTING DROP | 7.5 | 298 | 0.2 M Ammonium sulfate, 20 % PEG 3350, pH 7.5, VAPOR DIFFUSION, SITTING DROP, temperature 298K |
