- PDB-5ays: Crystal structure of SAUGI/HSV UDG complex -
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IDまたはキーワード:
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基本情報
登録情報
データベース: PDB / ID: 5ays
タイトル
Crystal structure of SAUGI/HSV UDG complex
要素
Uncharacterized protein
Uracil-DNA glycosylase
キーワード
HYDROLASE INHIBITOR / DNA mimic protein / DNA mimicking / uracil-DNA glycosylase inhibitor / uracil-DNA glycosylase / Herpes simplex virus
機能・相同性
機能・相同性情報
base-excision repair, AP site formation via deaminated base removal / uracil-DNA glycosylase / uracil DNA N-glycosylase activity / host cell nucleus / metal ion binding 類似検索 - 分子機能
S. aureus uracil DNA glycosylase inhibitor / S. aureus uracil DNA glycosylase inhibitor / Uracil DNA glycosylase inhibitor superfamily / S. aureus uracil DNA glycosylase inhibitor / Uracil-DNA glycosylase family 1 / Uracil DNA glycosylase superfamily / UreE urease accessory protein, C-terminal domain / Uracil-DNA glycosylase, active site / Uracil-DNA glycosylase signature. / Uracil-DNA Glycosylase, subunit E ...S. aureus uracil DNA glycosylase inhibitor / S. aureus uracil DNA glycosylase inhibitor / Uracil DNA glycosylase inhibitor superfamily / S. aureus uracil DNA glycosylase inhibitor / Uracil-DNA glycosylase family 1 / Uracil DNA glycosylase superfamily / UreE urease accessory protein, C-terminal domain / Uracil-DNA glycosylase, active site / Uracil-DNA glycosylase signature. / Uracil-DNA Glycosylase, subunit E / Uracil-DNA glycosylase-like domain / Uracil-DNA glycosylase-like / Uracil DNA glycosylase superfamily / Uracil-DNA glycosylase-like domain superfamily / Nuclear Transport Factor 2; Chain: A, / Roll / 3-Layer(aba) Sandwich / Alpha Beta 類似検索 - ドメイン・相同性
Uracil-DNA glycosylase / Uncharacterized protein 類似検索 - 構成要素
生物種
Human herpesvirus 1 (ヘルペスウイルス) Staphylococcus aureus (黄色ブドウ球菌)
解像度: 2.09→20 Å / Cor.coef. Fo:Fc: 0.948 / Cor.coef. Fo:Fc free: 0.933 / SU B: 4.807 / SU ML: 0.128 / 交差検証法: THROUGHOUT / ESU R: 0.261 / ESU R Free: 0.187 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.22253
2191
5 %
RANDOM
Rwork
0.19486
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obs
0.19629
41236
94.38 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK