ENGINEERED RESIDUE IN CHAIN A, SER 43 TO PRO ENGINEERED RESIDUE IN CHAIN A, THR 44 TO ARG ...ENGINEERED RESIDUE IN CHAIN A, SER 43 TO PRO ENGINEERED RESIDUE IN CHAIN A, THR 44 TO ARG ENGINEERED RESIDUE IN CHAIN A, HIS 47 TO MET ENGINEERED RESIDUE IN CHAIN A, LEU 48 TO ILE ENGINEERED RESIDUE IN CHAIN A, ALA 186 TO THR
配列の詳細
UNIPROT DEPOSITION P04789 IS 94 PERCENT IDENTICAL IN SEQUENCE TO MONOTIM MUTANT RMM0-1
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.17 Å3/Da / 溶媒含有率: 43.31 % / 解説: NONE
結晶化
温度: 291 K / pH: 6.2 詳細: 100 MM MES BUFFER PH 6.2, 180 MM LI2SO4, 26 PERCENT PEG 6000, 5 MM DITHIOTHREITOL, 1 MM EDTA AND 1 MM NAN3, AT 18 DEGREES CELSIUS.
解像度: 1.65→20.24 Å / Cor.coef. Fo:Fc: 0.914 / Cor.coef. Fo:Fc free: 0.878 / SU B: 1.98 / SU ML: 0.071 / 交差検証法: THROUGHOUT / ESU R: 0.15 / ESU R Free: 0.141 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.25548
2552
9.9 %
RANDOM
Rwork
0.21103
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obs
0.2155
23193
91.78 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK