6LFX
Crystal structure of PCB4scFv(hN56D) in complex with PCB#77
Experimental procedure
Experimental method | SINGLE WAVELENGTH |
Source type | SYNCHROTRON |
Source details | PHOTON FACTORY BEAMLINE AR-NE3A |
Synchrotron site | Photon Factory |
Beamline | AR-NE3A |
Temperature [K] | 100 |
Detector technology | PIXEL |
Collection date | 2015-11-03 |
Detector | DECTRIS PILATUS 2M |
Wavelength(s) | 1 |
Spacegroup name | I 4 |
Unit cell lengths | 91.842, 91.842, 53.969 |
Unit cell angles | 90.00, 90.00, 90.00 |
Refinement procedure
Resolution | 32.680 - 1.430 |
R-factor | 0.137 |
Rwork | 0.136 |
R-free | 0.16560 |
Structure solution method | MOLECULAR REPLACEMENT |
Starting model (for MR) | 3esu |
RMSD bond length | 0.009 |
RMSD bond angle | 1.124 |
Data reduction software | HKL-2000 |
Phasing software | MOLREP |
Refinement software | PHENIX (1.13_2998) |
Data quality characteristics
Overall | Outer shell | |
Low resolution limit [Å] | 32.680 | 1.450 |
High resolution limit [Å] | 1.430 | 1.430 |
Rmerge | 0.065 | 0.457 |
Number of reflections | 41553 | 2078 |
<I/σ(I)> | 40.4 | |
Completeness [%] | 100.0 | |
Redundancy | 6.6 |
Crystallization Conditions
crystal ID | method | pH | temperature | details |
1 | VAPOR DIFFUSION, HANGING DROP | 293 | CHES, 30% PEG 3350 |