4NYZ
The EMCV 3Dpol structure with altered motif A conformation at 2.15A resolution
Experimental procedure
| Experimental method | SINGLE WAVELENGTH |
| Source type | SYNCHROTRON |
| Source details | ALBA BEAMLINE XALOC |
| Synchrotron site | ALBA |
| Beamline | XALOC |
| Temperature [K] | 100 |
| Detector technology | PIXEL |
| Collection date | 2013-02-02 |
| Detector | PSI PILATUS 6M |
| Wavelength(s) | 0.979 |
| Spacegroup name | I 41 2 2 |
| Unit cell lengths | 122.553, 122.553, 198.797 |
| Unit cell angles | 90.00, 90.00, 90.00 |
Refinement procedure
| Resolution | 104.300 - 2.150 |
| R-factor | 0.23061 |
| Rwork | 0.229 |
| R-free | 0.25220 |
| Structure solution method | MOLECULAR REPLACEMENT |
| Starting model (for MR) | 1U09(THE HOMOLOGY MODEL HAS BEEN USED.) |
| RMSD bond length | 0.004 |
| RMSD bond angle | 0.877 |
| Data reduction software | XDS |
| Data scaling software | SCALA |
| Phasing software | PHASER |
| Refinement software | REFMAC (5.8.0049) |
Data quality characteristics
| Overall | Outer shell | |
| Low resolution limit [Å] | 104.300 | 2.270 |
| High resolution limit [Å] | 2.150 | 2.150 |
| Rmerge | 0.110 | 0.860 |
| Number of reflections | 40499 | |
| <I/σ(I)> | 6.4 | 18.7 |
| Completeness [%] | 98.4 | 98.3 |
| Redundancy | 5 | 5 |
Crystallization Conditions
| crystal ID | method | pH | temperature | details |
| 1 | VAPOR DIFFUSION, SITTING DROP | 7.5 | 277 | 10%PEG6000 and 2.0M NaCl, pH 7.5, VAPOR DIFFUSION, SITTING DROP, temperature 277K |
