3VWI
High resolution crystal structure of FraC in the monomeric form
Experimental procedure
Experimental method | SINGLE WAVELENGTH |
Source type | SYNCHROTRON |
Source details | PHOTON FACTORY BEAMLINE AR-NE3A |
Synchrotron site | Photon Factory |
Beamline | AR-NE3A |
Temperature [K] | 100 |
Detector technology | CCD |
Collection date | 2012-04-21 |
Detector | ADSC QUANTUM 210 |
Wavelength(s) | 1.000 |
Spacegroup name | P 1 21 1 |
Unit cell lengths | 77.170, 44.290, 114.710 |
Unit cell angles | 90.00, 92.80, 90.00 |
Refinement procedure
Resolution | 114.570 - 1.700 |
R-factor | 0.1549 |
Rwork | 0.153 |
R-free | 0.19360 |
Structure solution method | MOLECULAR REPLACEMENT |
Starting model (for MR) | 3lim |
RMSD bond length | 0.020 |
RMSD bond angle | 1.954 |
Data reduction software | MOSFLM |
Data scaling software | SCALA (3.3.20) |
Phasing software | MOLREP |
Refinement software | REFMAC |
Data quality characteristics
Overall | Inner shell | Outer shell | |
Low resolution limit [Å] | 114.573 | 36.681 | 1.790 |
High resolution limit [Å] | 1.700 | 5.380 | 1.700 |
Rmerge | 0.068 | 0.058 | 0.291 |
Rmeas | 0.068 | 0.348 | |
Rpim | 0.035 | 0.188 | |
Total number of observations | 9927 | 26760 | |
Number of reflections | 80105 | ||
<I/σ(I)> | 12.8 | 29.8 | 3.3 |
Completeness [%] | 93.7 | 97.6 | 75.1 |
Redundancy | 3.5 | 3.6 | 2.9 |
Crystallization Conditions
crystal ID | method | pH | temperature | details |
1 | VAPOR DIFFUSION, HANGING DROP | 7.4 | 293 | 20% Jeffamine, 0.1M HEPES, pH 7.4, VAPOR DIFFUSION, HANGING DROP, temperature 293K |