3F6V
Crystal structure of Possible transcriptional regulator for arsenical resistance
Experimental procedure
Experimental method | SINGLE WAVELENGTH |
Source type | SYNCHROTRON |
Source details | APS BEAMLINE 19-ID |
Synchrotron site | APS |
Beamline | 19-ID |
Temperature [K] | 100 |
Detector technology | CCD |
Collection date | 2008-08-07 |
Detector | ADSC QUANTUM 315 |
Wavelength(s) | 0.97929 |
Spacegroup name | P 41 21 2 |
Unit cell lengths | 42.106, 42.106, 104.219 |
Unit cell angles | 90.00, 90.00, 90.00 |
Refinement procedure
Resolution | 39.040 - 1.480 |
R-factor | 0.16143 |
Rwork | 0.159 |
R-free | 0.19929 |
Structure solution method | SAD |
RMSD bond length | 0.015 |
RMSD bond angle | 1.576 |
Data reduction software | HKL-3000 |
Data scaling software | HKL-3000 |
Phasing software | HKL-3000 |
Refinement software | REFMAC (5.5.0054) |
Data quality characteristics
Overall | Outer shell | |
Low resolution limit [Å] | 50.000 | 1.490 |
High resolution limit [Å] | 1.480 | 1.480 |
Rmerge | 0.078 | 0.350 |
Number of reflections | 16305 | |
<I/σ(I)> | 83.18 | 8.57 |
Completeness [%] | 99.0 | 73.5 |
Redundancy | 26.4 | 13.4 |
Crystallization Conditions
crystal ID | method | pH | temperature | details |
1 | VAPOR DIFFUSION, HANGING DROP | 297 | 0.2M Mg(OAC), 20%PEG3350, 1/200 papain w/w, VAPOR DIFFUSION, HANGING DROP, temperature 297K |