解像度: 1.3→40 Å / Num. obs: 31403 / % possible obs: 99.9 % / 冗長度: 14.5 % / Rmerge(I) obs: 0.056 / Χ2: 1.614 / Net I/σ(I): 12.2
反射 シェル
解像度 (Å)
冗長度 (%)
Rmerge(I) obs
Num. unique all
Χ2
Diffraction-ID
% possible all
1.3-1.32
13.8
0.465
1544
1.468
1,2
100
1.32-1.35
14.2
0.387
1535
1.465
1,2
100
1.35-1.37
14.3
0.346
1522
1.473
1,2
100
1.37-1.4
14.3
0.294
1544
1.375
1,2
100
1.4-1.43
14.3
0.253
1548
1.353
1,2
100
1.43-1.46
14.4
0.218
1521
1.302
1,2
100
1.46-1.5
14.3
0.169
1544
1.272
1,2
100
1.5-1.54
14.4
0.143
1549
1.285
1,2
100
1.54-1.59
14.4
0.124
1544
1.217
1,2
100
1.59-1.64
14.6
0.103
1542
1.18
1,2
100
1.64-1.7
14.5
0.092
1562
1.2
1,2
100
1.7-1.76
14.6
0.079
1548
1.199
1,2
100
1.76-1.84
14.7
0.068
1580
1.252
1,2
100
1.84-1.94
14.9
0.058
1545
1.365
1,2
100
1.94-2.06
15
0.057
1569
1.651
1,2
100
2.06-2.22
15
0.059
1600
2.209
1,2
100
2.22-2.45
15
0.061
1583
2.633
1,2
100
2.45-2.8
14.8
0.052
1614
2.424
1,2
100
2.8-3.53
14.3
0.042
1649
2.33
1,2
99.9
3.53-40
13.4
0.039
1760
2.384
1,2
98.5
-
位相決定
位相決定
手法: 単波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
DENZO
データ削減
SCALEPACK
データスケーリング
SHELX
位相決定
REFMAC
5.5.0102
精密化
PDB_EXTRACT
3.005
データ抽出
HKL-2000
データスケーリング
精密化
構造決定の手法: 単波長異常分散 / 解像度: 1.3→30 Å / Cor.coef. Fo:Fc: 0.947 / Cor.coef. Fo:Fc free: 0.92 / WRfactor Rfree: 0.234 / WRfactor Rwork: 0.211 / SU B: 0.726 / SU ML: 0.032 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.06 / ESU R Free: 0.061 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS U VALUES: REFINED INDIVIDUALLY The structure was solved using the selenomethionene derivative crystallized in space group I222 and a copper ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS U VALUES: REFINED INDIVIDUALLY The structure was solved using the selenomethionene derivative crystallized in space group I222 and a copper rotating anode. The programs ARP/WARP, COOT and MOLPROBITY were also used during model refinement.
Rfactor
反射数
%反射
Selection details
Rfree
0.233
1565
5.034 %
RANDOM
Rwork
0.209
-
-
-
obs
0.21
31089
99.926 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK BULK SOLVENT
原子変位パラメータ
Biso mean: 10.096 Å2
Baniso -1
Baniso -2
Baniso -3
1-
-0.007 Å2
0 Å2
0 Å2
2-
-
-0.007 Å2
0 Å2
3-
-
-
0.015 Å2
精密化ステップ
サイクル: LAST / 解像度: 1.3→30 Å
タンパク質
核酸
リガンド
溶媒
全体
原子数
983
0
3
108
1094
拘束条件
Refine-ID
タイプ
Dev ideal
Dev ideal target
数
X-RAY DIFFRACTION
r_bond_refined_d
0.016
0.022
1099
X-RAY DIFFRACTION
r_bond_other_d
0.001
0.02
752
X-RAY DIFFRACTION
r_angle_refined_deg
1.632
1.977
1519
X-RAY DIFFRACTION
r_angle_other_deg
0.968
3
1864
X-RAY DIFFRACTION
r_dihedral_angle_1_deg
5.307
5
153
X-RAY DIFFRACTION
r_dihedral_angle_2_deg
36.245
23.636
44
X-RAY DIFFRACTION
r_dihedral_angle_3_deg
13.53
15
189
X-RAY DIFFRACTION
r_dihedral_angle_4_deg
9.874
15
6
X-RAY DIFFRACTION
r_chiral_restr
0.103
0.2
172
X-RAY DIFFRACTION
r_gen_planes_refined
0.009
0.021
1226
X-RAY DIFFRACTION
r_gen_planes_other
0.001
0.02
213
X-RAY DIFFRACTION
r_mcbond_it
1.096
1.5
680
X-RAY DIFFRACTION
r_mcbond_other
0.308
1.5
263
X-RAY DIFFRACTION
r_mcangle_it
1.855
2
1115
X-RAY DIFFRACTION
r_scbond_it
2.443
3
419
X-RAY DIFFRACTION
r_scangle_it
3.455
4.5
390
LS精密化 シェル
Refine-ID: X-RAY DIFFRACTION / Total num. of bins used: 20