ENGINEERED RESIDUE IN CHAIN A, ILE 878 TO MSE ENGINEERED RESIDUE IN CHAIN A, ILE 978 TO MSE ...ENGINEERED RESIDUE IN CHAIN A, ILE 878 TO MSE ENGINEERED RESIDUE IN CHAIN A, ILE 978 TO MSE ENGINEERED RESIDUE IN CHAIN A, LEU1004 TO MSE ENGINEERED RESIDUE IN CHAIN B, ILE 878 TO MSE ENGINEERED RESIDUE IN CHAIN B, ILE 978 TO MSE ENGINEERED RESIDUE IN CHAIN B, LEU1004 TO MSE ENGINEERED RESIDUE IN CHAIN C, ILE 878 TO MSE ENGINEERED RESIDUE IN CHAIN C, ILE 978 TO MSE ENGINEERED RESIDUE IN CHAIN C, LEU1004 TO MSE ENGINEERED RESIDUE IN CHAIN D, ILE 878 TO MSE ENGINEERED RESIDUE IN CHAIN D, ILE 978 TO MSE ENGINEERED RESIDUE IN CHAIN D, LEU1004 TO MSE ENGINEERED RESIDUE IN CHAIN E, ILE 878 TO MSE ENGINEERED RESIDUE IN CHAIN E, ILE 978 TO MSE ENGINEERED RESIDUE IN CHAIN E, LEU1004 TO MSE ENGINEERED RESIDUE IN CHAIN F, ILE 878 TO MSE ENGINEERED RESIDUE IN CHAIN F, ILE 978 TO MSE ENGINEERED RESIDUE IN CHAIN F, LEU1004 TO MSE
配列の詳細
R180K IN CDNA, I127M, I227M, L253M FOR PHASING WITH SEMET
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.66 Å3/Da / 溶媒含有率: 40.8 % / 解説: THIS DATA SET WAS USED FOR REFINEMENT
モノクロメーター: SI (111) CHANNEL-CUT CRYSTAL / プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
ID
波長 (Å)
相対比
1
1.033
1
2
0.979
1
反射
解像度: 2.34→34.58 Å / Num. obs: 57496 / % possible obs: 99 % / Observed criterion σ(I): 0 / 冗長度: 3.8 % / Biso Wilson estimate: 51.072 Å2 / Rmerge(I) obs: 0.06 / Net I/σ(I): 15.1
反射 シェル
解像度: 2.34→2.46 Å / 冗長度: 2.8 % / Rmerge(I) obs: 0.49 / Mean I/σ(I) obs: 2 / % possible all: 95.4
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.5.0088
精密化
XDS
データ削減
SCALA
データスケーリング
SOLVE
位相決定
精密化
構造決定の手法: 単波長異常分散 開始モデル: NONE 解像度: 2.34→34.58 Å / Cor.coef. Fo:Fc: 0.936 / Cor.coef. Fo:Fc free: 0.898 / SU B: 9.57 / SU ML: 0.23 / 交差検証法: THROUGHOUT / ESU R: 0.392 / ESU R Free: 0.286 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. U VALUES REFINED INDIVIDUALLY.
Rfactor
反射数
%反射
Selection details
Rfree
0.29391
2843
5 %
RANDOM
Rwork
0.23329
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obs
0.23633
54583
98.86 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK