The sequence of this protein is not available at UNP database at the time of processing. Residues - ...The sequence of this protein is not available at UNP database at the time of processing. Residues -19 to 0 are expression tags.
温度: 295 K / 手法: 蒸気拡散法, ハンギングドロップ法 / pH: 7 詳細: 13%PEG2000MME, 50 mM Na-HEPES pH 7.0, 500 mM NaCl, VAPOR DIFFUSION, HANGING DROP, temperature 295K
-
データ収集
回折
ID
平均測定温度 (K)
Crystal-ID
1
100
1
2
100
1
1,2
1
放射光源
由来
サイト
ビームライン
ID
波長 (Å)
シンクロトロン
APS
24-ID-C
1
0.97925, 0.97941, 0.96403
シンクロトロン
APS
24-ID-C
2
1.28281
放射
ID
プロトコル
単色(M)・ラウエ(L)
散乱光タイプ
Wavelength-ID
1
MAD
M
x-ray
1
2
SINGLEWAVELENGTH
M
x-ray
2
放射波長
ID
波長 (Å)
相対比
1
0.97925
1
2
0.97941
1
3
0.96403
1
4
1.28281
1
Reflection
冗長度: 6.9 % / Av σ(I) over netI: 13.4 / 数: 266945 / Rmerge(I) obs: 0.079 / Χ2: 1.02 / D res high: 3.2 Å / D res low: 50 Å / Num. obs: 38657 / % possible obs: 98.3
Diffraction reflection shell
最高解像度 (Å)
最低解像度 (Å)
% possible obs (%)
ID
Rmerge(I) obs
Chi squared
Redundancy
6.89
50
99.3
1
0.055
1.024
7.1
5.47
6.89
100
1
0.079
1.025
7.1
4.78
5.47
100
1
0.077
1.027
7.3
4.34
4.78
100
1
0.067
1.002
7.3
4.03
4.34
100
1
0.077
1.003
7.3
3.79
4.03
100
1
0.105
1.018
7.4
3.6
3.79
100
1
0.134
1.018
7.3
3.45
3.6
99.9
1
0.186
1.022
7.1
3.31
3.45
98.2
1
0.261
1.031
6
3.2
3.31
85.9
1
0.305
1.019
4.9
反射
解像度: 3.2→50 Å / Num. obs: 38657 / % possible obs: 98.3 % / 冗長度: 6.9 % / Rmerge(I) obs: 0.079 / Χ2: 1.019 / Net I/σ(I): 13.4
構造決定の手法: 多波長異常分散 / 解像度: 3.2→50 Å / Cor.coef. Fo:Fc: 0.908 / Cor.coef. Fo:Fc free: 0.888 / SU B: 59.032 / SU ML: 0.486 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R Free: 0.617 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. The data were collected from 2 crystals. One crystal was used for Se MAD, and the other one for Zn SAD. The Se MAD data was used for ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. The data were collected from 2 crystals. One crystal was used for Se MAD, and the other one for Zn SAD. The Se MAD data was used for phasing/structure determination. The Zn data was used solelly to determine the Zn sites
Rfactor
反射数
%反射
Selection details
Rfree
0.292
3880
10 %
RANDOM
Rwork
0.253
-
-
-
obs
0.257
34862
98.51 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK