- PDB-2j2c: Crystal structure of Human Cytosolic 5'-Nucleotidase II (NT5C2, cN-II) -
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基本情報
登録情報
データベース: PDB / ID: 2j2c
タイトル
Crystal structure of Human Cytosolic 5'-Nucleotidase II (NT5C2, cN-II)
要素
CYTOSOLIC PURINE 5'-NUCLEOTIDASE
キーワード
HYDROLASE / CYTOSOLIC 5-PRIME NUCLEOTIDASE II / ALLOSTERIC ENZYME / GMP- IMP SPECIFIC NUCLEOTIDASE / HIGH KM 5-PRIME NUCLEOTIDASE / CN- II / NT5C2 / CYTOSOLIC PURINE 5- PRIME NUCLEOTIDASE
機能・相同性
機能・相同性情報
nucleoside phosphotransferase / nucleoside phosphotransferase activity / dGMP metabolic process / GMP metabolic process / Abacavir metabolism / negative regulation of defense response to virus by host / GMP 5'-nucleotidase activity / adenosine metabolic process / IMP-specific 5'-nucleotidase / IMP 5'-nucleotidase activity ...nucleoside phosphotransferase / nucleoside phosphotransferase activity / dGMP metabolic process / GMP metabolic process / Abacavir metabolism / negative regulation of defense response to virus by host / GMP 5'-nucleotidase activity / adenosine metabolic process / IMP-specific 5'-nucleotidase / IMP 5'-nucleotidase activity / Ribavirin ADME / IMP metabolic process / IMP catabolic process / Purine catabolism / allantoin metabolic process / XMP 5'-nucleosidase activity / 5'-nucleotidase / 5'-nucleotidase activity / protein K48-linked ubiquitination / ubiquitin protein ligase activity / ATP binding / identical protein binding / metal ion binding / cytosol / cytoplasm 類似検索 - 分子機能
OUR CONSTRUCT CONTAINS RESIDUES 1-536 OUT OF THE 561 AMINO ACIDS. ADDITIONALLY IT CONTAINS AN N- ...OUR CONSTRUCT CONTAINS RESIDUES 1-536 OUT OF THE 561 AMINO ACIDS. ADDITIONALLY IT CONTAINS AN N-TERMINAL HISTAG MGSSHHHHHHSSGLVPRGS
解像度: 2.2→40 Å / Cor.coef. Fo:Fc: 0.955 / Cor.coef. Fo:Fc free: 0.94 / SU B: 5.989 / SU ML: 0.085 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.161 / ESU R Free: 0.142 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. RESIDUES 3-400 AND 417-488 OUT OF 536 RESIDUES ARE MODELLED
Rfactor
反射数
%反射
Selection details
Rfree
0.184
1967
5 %
RANDOM
Rwork
0.152
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obs
0.154
37234
100 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK