温度: 290 K / 手法: 蒸気拡散法, ハンギングドロップ法 / pH: 5.5 詳細: The concentration of both oligonucleotides was adjusted to 1.1 mM for the duplex molecule by dissolving each one in 10 mM MES pH 6.5 and 50 mM KCl. They were annealed by heating to 367K for ...詳細: The concentration of both oligonucleotides was adjusted to 1.1 mM for the duplex molecule by dissolving each one in 10 mM MES pH 6.5 and 50 mM KCl. They were annealed by heating to 367K for 10 minutes and allowed to cool to room temperature. Crystals with oligonucleotide 5ov4 were grown at 290K with the D153K variant of T5Fen. The resulting T5FenD153K:5ov4 structure was determined from crystals grown in 0.2 M MgCl2, 0.1 M Bis-Tris buffer pH 5.5, 25% w/v PEG 3350.
解像度: 2.22→42.19 Å / Cor.coef. Fo:Fc: 0.959 / Cor.coef. Fo:Fc free: 0.932 / WRfactor Rfree: 0.2347 / WRfactor Rwork: 0.1834 / FOM work R set: 0.8335 / SU B: 14.251 / SU ML: 0.175 / SU R Cruickshank DPI: 0.3029 / SU Rfree: 0.2192 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.303 / ESU R Free: 0.219 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS U VALUES : WITH TLS ADDED
Rfactor
反射数
%反射
Selection details
Rfree
0.2344
1595
5 %
RANDOM
Rwork
0.1826
-
-
-
obs
0.1851
30073
99.35 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK