subtilisin / sporulation resulting in formation of a cellular spore / serine-type endopeptidase activity / proteolysis / extracellular region / metal ion binding 類似検索 - 分子機能
SEQUENCE IS SAME FOR DEPOSITED COORDINATES BUT NUMBERING IS NON- CONTIGUOUS AS IT IS BASED ON ...SEQUENCE IS SAME FOR DEPOSITED COORDINATES BUT NUMBERING IS NON- CONTIGUOUS AS IT IS BASED ON ALIGNMENT TO AN HOMOLOGOUS SECTION OF UNIPROT SEQUENCE P00782 FOR SUBTILISIN BPN' FROM BACILLUS AMYLOLIQUEFACIENS, RESIDUES 108 TO 382. THUS THERE ARE NO RESIDUES 36, 58, 158-159 OR 163-164.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.25 Å3/Da / 溶媒含有率: 45 % / 解説: NONE
結晶化
詳細: 9% PEG 3350, 50 MM AMMONIUM SULFATE, 0.1 M BIS-TRIS PH 5.5
解像度: 1.1→47.34 Å / Cor.coef. Fo:Fc: 0.986 / Cor.coef. Fo:Fc free: 0.985 / SU B: 0.309 / SU ML: 0.007 / 交差検証法: THROUGHOUT / ESU R: 0.017 / ESU R Free: 0.017 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 4-VINYLPHENYL METHANESULFONYL IS MODELLED WITH THE C ATOMS AT AN OCCUPANCY OF 0.5 AND THE SULFONYL GROUP AT AN OCCUPANCY OF 0.75. THE SIDE ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 4-VINYLPHENYL METHANESULFONYL IS MODELLED WITH THE C ATOMS AT AN OCCUPANCY OF 0.5 AND THE SULFONYL GROUP AT AN OCCUPANCY OF 0.75. THE SIDE CHAIN OF HIS64 IS MODELLED WITH A SECOND ORIENTATION AT OCCUPANCY 0.15 BECAUSE THERE IS DIFFERENCE DENSITY IN THAT REGION IN AN FO-FC MAP IF THE SECOND CONFORMATION IS OMITTED. THERE IS UNMODELLED ELECTRON DENSITY BETWEEN THE SIDE CHAINS OF ASN155, PHE189 AND ASN218. THERE ARE 2 REGIONS OF UNMODELLED DENSITY EITHER SIDE OF THE SIDE CHAIN OF SER56, NEAR THE SIDE CHAINS OF GLU54 AND THR57. THERE IS UNMODELLED DENSITY AROUND ARG275, WHICH IS PARTIALLY OCCUPIED. THERE IS ONLY ONE CA ION, ALTHOUGH THE GENERAL ANNOTATION FOR UNIPROT ENTRY P29600 COMMENTS THAT 2 CALCIUM IONS BIND PER SUBUNIT.
Rfactor
反射数
%反射
Selection details
Rfree
0.0877
4790
5 %
RANDOM
Rwork
0.0764
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obs
0.07697
91447
97.78 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK