PROTEIN BINDING / Immunoglobulin M / antibody / oligomerization / Immunoglobulin fold / Receptor
機能・相同性
機能・相同性情報
CD22 mediated BCR regulation / IgM B cell receptor complex / pentameric IgM immunoglobulin complex / B cell receptor complex / Cell surface interactions at the vascular wall / positive regulation of B cell activation / Antigen activates B Cell Receptor (BCR) leading to generation of second messengers / pre-B cell allelic exclusion / early endosome to late endosome transport / B cell affinity maturation ...CD22 mediated BCR regulation / IgM B cell receptor complex / pentameric IgM immunoglobulin complex / B cell receptor complex / Cell surface interactions at the vascular wall / positive regulation of B cell activation / Antigen activates B Cell Receptor (BCR) leading to generation of second messengers / pre-B cell allelic exclusion / early endosome to late endosome transport / B cell affinity maturation / humoral immune response mediated by circulating immunoglobulin / regulation of cell morphogenesis / regulation of immunoglobulin production / immunoglobulin receptor binding / immunoglobulin complex, circulating / antigen processing and presentation / B cell activation / B cell proliferation / immunoglobulin mediated immune response / positive regulation of endocytosis / antigen binding / positive regulation of B cell proliferation / B cell receptor signaling pathway / positive regulation of immune response / transmembrane signaling receptor activity / MAPK cascade / defense response to Gram-negative bacterium / positive regulation of MAPK cascade / external side of plasma membrane / perinuclear region of cytoplasm / cell surface / extracellular space / identical protein binding / membrane / plasma membrane / cytoplasm 類似検索 - 分子機能
解像度: 1.3→10 Å / Cor.coef. Fo:Fc: 0.977 / Cor.coef. Fo:Fc free: 0.973 / SU B: 1.448 / SU ML: 0.028 / 交差検証法: THROUGHOUT / ESU R: 0.047 / ESU R Free: 0.045 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.16814
2411
5 %
RANDOM
Rwork
0.13779
-
-
-
all
0.141
45796
-
-
obs
0.1393
45796
99.3 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK