温度: 277 K / 手法: 蒸気拡散法, シッティングドロップ法 / pH: 9 詳細: Protein solution (25mM sodium acetate, pH5.0) mixed in a 1:1 ratio with the well solution (4% 2-propanol, 0.1M BTP pH9.0, 20% MEPEG 5K) Cryoprotected with 4%2-propanol, 25% MEPEG 5K, 0.1M BTP ...詳細: Protein solution (25mM sodium acetate, pH5.0) mixed in a 1:1 ratio with the well solution (4% 2-propanol, 0.1M BTP pH9.0, 20% MEPEG 5K) Cryoprotected with 4%2-propanol, 25% MEPEG 5K, 0.1M BTP pH9.0, 10% ethylene glycol, Vapor diffusion, sitting drop, temperature 277K
冗長度: 4.2 % / Av σ(I) over netI: 10.21 / 数: 229956 / Rmerge(I) obs: 0.147 / Χ2: 1.22 / D res high: 2.5 Å / D res low: 50 Å / Num. obs: 54914 / % possible obs: 99.8
Diffraction reflection shell
最高解像度 (Å)
最低解像度 (Å)
% possible obs (%)
ID
Rmerge(I) obs
Chi squared
Redundancy
6.78
50
99.5
1
0.045
0.949
4.1
5.38
6.78
99.6
1
0.072
0.958
4.2
4.7
5.38
99.4
1
0.088
1.151
4.2
4.27
4.7
98.8
1
0.093
1.061
4.1
3.97
4.27
99.4
1
0.102
1.161
4.1
3.73
3.97
99.7
1
0.116
1.151
4.2
3.55
3.73
99.8
1
0.133
1.251
4.2
3.39
3.55
99.9
1
0.157
1.243
4.2
3.26
3.39
100
1
0.184
1.218
4.3
3.15
3.26
99.9
1
0.22
1.291
4.2
3.05
3.15
100
1
0.248
1.361
4.2
2.96
3.05
100
1
0.288
1.35
4.2
2.89
2.96
99.9
1
0.357
1.314
4.2
2.82
2.89
99.9
1
0.393
1.314
4.2
2.75
2.82
100
1
0.466
1.273
4.2
2.69
2.75
100
1
0.483
1.241
4.2
2.64
2.69
100
1
0.57
1.33
4.2
2.59
2.64
100
1
0.69
1.222
4.2
2.54
2.59
100
1
0.737
1.226
4.2
2.5
2.54
99.9
1
0.849
1.246
4.2
反射
解像度: 2.48→50 Å / Num. obs: 54914 / % possible obs: 99.8 % / 冗長度: 4.2 % / Rmerge(I) obs: 0.147 / Χ2: 1.216 / Net I/σ(I): 6.4
解像度: 2.48→44.89 Å / Cor.coef. Fo:Fc: 0.94 / Cor.coef. Fo:Fc free: 0.883 / Occupancy max: 1 / Occupancy min: 0.38 / SU B: 20.831 / SU ML: 0.234 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.914 / ESU R Free: 0.336 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN USED IF PRESENT IN THE INPUT U VALUES : WITH TLS ADDED
Rfactor
反射数
%反射
Selection details
Rfree
0.2702
1820
3.6 %
RANDOM
Rwork
0.2014
-
-
-
obs
0.2038
51066
91.73 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK