negative regulation of ERBB signaling pathway / legumain / vacuolar protein processing / renal system process / Vitamin D (calciferol) metabolism / receptor catabolic process / vitamin D metabolic process / endolysosome lumen / response to acidic pH / dendritic spine organization ...negative regulation of ERBB signaling pathway / legumain / vacuolar protein processing / renal system process / Vitamin D (calciferol) metabolism / receptor catabolic process / vitamin D metabolic process / endolysosome lumen / response to acidic pH / dendritic spine organization / positive regulation of monocyte chemotaxis / Trafficking and processing of endosomal TLR / positive regulation of endothelial cell chemotaxis / negative regulation of multicellular organism growth / cellular response to hepatocyte growth factor stimulus / associative learning / endopeptidase activator activity / MHC class II antigen presentation / positive regulation of mitotic cell cycle / lysosomal lumen / cellular response to calcium ion / proteolysis involved in protein catabolic process / protein maturation / positive regulation of long-term synaptic potentiation / antigen processing and presentation of exogenous peptide antigen via MHC class II / tau protein binding / memory / cellular response to amyloid-beta / apical part of cell / late endosome / peptidase activity / negative regulation of neuron apoptotic process / lysosome / negative regulation of gene expression / cysteine-type endopeptidase activity / positive regulation of cell population proliferation / perinuclear region of cytoplasm / proteolysis / extracellular exosome / extracellular region / cytoplasm 類似検索 - 分子機能
構造決定の手法: 分子置換 / 解像度: 3.9→49.63 Å / Cor.coef. Fo:Fc: 0.775 / Cor.coef. Fo:Fc free: 0.722 / SU B: 55.155 / SU ML: 0.76 / 交差検証法: THROUGHOUT / σ(F): 2 / ESU R Free: 0.975 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN USED IF PRESENT IN THE INPUT
Rfactor
反射数
%反射
Selection details
Rfree
0.29963
503
4.8 %
RANDOM
Rwork
0.28582
-
-
-
all
0.2867
10515
-
-
obs
0.28648
9976
99.21 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK