NTERMINAL SEQUENCE GPLGSM IS AN INSERTION COMING FROM THE EXPRESSION PLASMID USED. GLN 85 WAS ...NTERMINAL SEQUENCE GPLGSM IS AN INSERTION COMING FROM THE EXPRESSION PLASMID USED. GLN 85 WAS MUTATED TO LEU. VAL 100, GLN 153, VAL 158 AND ILE 192 WERE MUTATED TO MET. NTERMINAL SEQUENCE GPLGSM IS AN INSERTION COMING FROM THE EXPRESSION PLASMID USED. LAST SIX RESIDUES CORRESPONDS TO THE 6HIS-TAG
解像度: 2.97→120.89 Å / Cor.coef. Fo:Fc: 0.927 / Cor.coef. Fo:Fc free: 0.89 / SU B: 18.406 / SU ML: 0.308 / 交差検証法: THROUGHOUT / ESU R Free: 0.363 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. MISSING RESIDUES. RESIDUES 1-21, 149-152 AND 198-225 OF CHAIN A. RESIDUES 1-20 AND 199-225 OF CHAIN B. RESIDUES 1- 21, 149-152 AND 198-225 ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. MISSING RESIDUES. RESIDUES 1-21, 149-152 AND 198-225 OF CHAIN A. RESIDUES 1-20 AND 199-225 OF CHAIN B. RESIDUES 1- 21, 149-152 AND 198-225 OF CHAIN C. RESIDUES 450-452 AND 621-640 OF CHAIN D. RESIDUES 450-452 AND 619-640 OF CHAIN E. RESIDUES 450-453 AND 619-640 OF CHAIN F. RESIDUES FROM - 5 TO 0. CTERMINAL HIS-TAGS IN CHAINS D, E AND F.
Rfactor
反射数
%反射
Selection details
Rfree
0.2322
1679
5.1 %
RANDOM
Rwork
0.19489
-
-
-
obs
0.1968
31378
97.11 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK