regulation of postsynaptic density protein 95 clustering / positive regulation of filopodium assembly / positive regulation of dendritic spine development / modulation of excitatory postsynaptic potential / site of DNA damage / positive regulation of dendritic spine maintenance / protein localization to chromatin / methylated histone binding / negative regulation of cell migration / dendritic shaft ...regulation of postsynaptic density protein 95 clustering / positive regulation of filopodium assembly / positive regulation of dendritic spine development / modulation of excitatory postsynaptic potential / site of DNA damage / positive regulation of dendritic spine maintenance / protein localization to chromatin / methylated histone binding / negative regulation of cell migration / dendritic shaft / positive regulation of transcription elongation by RNA polymerase II / double-strand break repair via homologous recombination / lysine-acetylated histone binding / transcription corepressor activity / chromatin organization / nervous system development / DNA-binding transcription factor binding / dendritic spine / protein domain specific binding / chromatin / nucleolus / negative regulation of transcription by RNA polymerase II / zinc ion binding / nucleoplasm / nucleus / cytoplasm 類似検索 - 分子機能
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.9796 Å / 相対比: 1
反射
解像度: 1.67→49.2 Å / Num. obs: 38079 / % possible obs: 99.9 % / Observed criterion σ(I): -3 / 冗長度: 6 % / Rmerge(I) obs: 0.08 / Net I/σ(I): 12.2
反射 シェル
解像度: 1.67→1.77 Å / 冗長度: 4.5 % / Rmerge(I) obs: 0.77 / Mean I/σ(I) obs: 2 / % possible all: 99.7
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.8.0049
精密化
XDS
データ削減
SCALA
データスケーリング
SHELXD
位相決定
精密化
構造決定の手法: 単波長異常分散 開始モデル: NONE 解像度: 1.67→49.2 Å / Cor.coef. Fo:Fc: 0.967 / Cor.coef. Fo:Fc free: 0.956 / SU B: 5.168 / SU ML: 0.088 / 交差検証法: THROUGHOUT / ESU R: 0.103 / ESU R Free: 0.102 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. U VALUES WITH TLS ADDED
Rfactor
反射数
%反射
Selection details
Rfree
0.21039
1900
5 %
RANDOM
Rwork
0.17589
-
-
-
obs
0.17753
36091
99.81 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK