ENGINEERED RESIDUE IN CHAIN A, ILE 199 TO ALA ENGINEERED RESIDUE IN CHAIN A, TYR 326 TO ALA ...ENGINEERED RESIDUE IN CHAIN A, ILE 199 TO ALA ENGINEERED RESIDUE IN CHAIN A, TYR 326 TO ALA ENGINEERED RESIDUE IN CHAIN B, ILE 199 TO ALA ENGINEERED RESIDUE IN CHAIN B, TYR 326 TO ALA
Has protein modification
Y
配列の詳細
DISCREPANCIES OCCUR AT SITES 199 AND 326 BECAUSE SITE- DIRECTED MUTAGENESIS HAS BEEN PERFORMED IN ...DISCREPANCIES OCCUR AT SITES 199 AND 326 BECAUSE SITE- DIRECTED MUTAGENESIS HAS BEEN PERFORMED IN ORDER TO STUDY THESE GATING RESIDUES
-
実験情報
-
実験
実験
手法: X線回折 / 使用した結晶の数: 1
-
試料調製
結晶
マシュー密度: 2.74 Å3/Da / 溶媒含有率: 52 % / 解説: NONE
結晶化
pH: 6.5 詳細: 12% PEG4000, 100 MM ADA PH 6.5, 70 MM LITHIUM SULPHATE, 8.5 MM ZWITTERGENT 3-12
解像度: 2.2→43.31 Å / Cor.coef. Fo:Fc: 0.931 / Cor.coef. Fo:Fc free: 0.882 / SU B: 5.036 / SU ML: 0.131 / 交差検証法: THROUGHOUT / ESU R: 0.229 / ESU R Free: 0.2 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.24401
1667
2.6 %
RANDOM
Rwork
0.19042
-
-
-
obs
0.19179
62656
97.94 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK