THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH ...THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
解像度: 1.91→28.923 Å / Num. obs: 43643 / % possible obs: 96.6 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 32.356 Å2 / Rmerge(I) obs: 0.042 / Net I/σ(I): 10.4
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
1.91-1.98
0.543
1.9
13866
8670
1
97.6
1.98-2.06
0.389
2.6
13441
8415
1
98.4
2.06-2.15
0.285
3.5
12915
8084
1
97.9
2.15-2.26
0.197
4.9
13203
8236
1
97.7
2.26-2.41
0.141
6.5
14361
8974
1
98.2
2.41-2.59
0.104
8.4
13044
8126
1
98.1
2.59-2.85
0.067
11.4
13486
8412
1
97.4
2.85-3.26
0.039
17.1
13084
8209
1
95.7
3.26-4.1
0.028
22.9
12605
7970
1
92.6
4.1-28.923
0.022
26.4
13025
8095
1
92.6
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
SHELX
位相決定
REFMAC
5.5.0110
精密化
XSCALE
データスケーリング
PDB_EXTRACT
3.1
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.91→28.923 Å / Cor.coef. Fo:Fc: 0.97 / Cor.coef. Fo:Fc free: 0.956 / Occupancy max: 1 / Occupancy min: 0.3 / SU B: 6.692 / SU ML: 0.098 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.145 / ESU R Free: 0.135 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 3. GLYCEROL (GOL) AND CHLORIDE (CL) MODELED ARE PRESENT IN CRYO/CRYSTALLIZATION CONDITIONS. 4. ATOM RECORD CONTAINS SUM OF TLS AND RESIDUAL B FACTORS. ANISOU RECORD CONTAINS SUM OF TLS AND RESIDUAL U FACTORS. 5. WATERS WERE EXCLUDED FROM AUTOMATIC TLS ASSIGNMENT.
Rfactor
反射数
%反射
Selection details
Rfree
0.2109
2199
5 %
RANDOM
Rwork
0.1694
-
-
-
obs
0.1715
43627
98.99 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK