THE CONSTRUCT (RESIDUES 20-400) WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG ...THE CONSTRUCT (RESIDUES 20-400) WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
モノクロメーター: Double crystal monochromator / プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.97922 Å / 相対比: 1
反射
解像度: 1.95→43.402 Å / Num. obs: 31230 / % possible obs: 99.2 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 20.621 Å2 / Rmerge(I) obs: 0.101 / Net I/σ(I): 8.83
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
% possible all
1.95-2.02
0.47
2.3
10715
3082
97.6
2.02-2.1
0.343
3.2
10920
3055
99.3
2.1-2.2
0.272
4
11883
3261
99.9
2.2-2.31
0.223
5
10632
2914
98.9
2.31-2.46
0.176
6.3
12052
3242
99.8
2.46-2.65
0.144
7.6
11557
3107
99.8
2.65-2.91
0.113
9.6
11353
3061
99.5
2.91-3.33
0.086
13
11669
3140
99.9
3.33-4.19
0.057
17.7
11440
3139
98.5
4.19-43.402
0.058
19.1
11345
3226
98.8
-
位相決定
位相決定
手法: 単波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.5.0110
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 単波長異常分散 / 解像度: 1.95→43.402 Å / Cor.coef. Fo:Fc: 0.96 / Cor.coef. Fo:Fc free: 0.941 / Occupancy max: 1 / Occupancy min: 0.3 / SU B: 3.259 / SU ML: 0.092 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R Free: 0.137 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED ...詳細: 1. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 2. ISOPROPANOL (IPA) AND ETHYLENE GLYCOL (EDO) MODELED IS PRESENT IN CRYSTALLIZATION/CRYO CONDITIONS. 3. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.198
1572
5 %
RANDOM
Rwork
0.156
-
-
-
obs
0.158
31217
99.27 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK