THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH ...THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
解像度: 1.9→28.52 Å / Num. obs: 13586 / % possible obs: 99.8 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 25.266 Å2 / Rmerge(I) obs: 0.082 / Net I/σ(I): 13.29
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
1.9-1.97
0.814
1.7
9654
2567
1
99.1
1.97-2.05
0.592
2.3
9547
2500
1
99.8
2.05-2.14
0.405
3.4
9176
2392
1
99.9
2.14-2.25
0.316
4.4
9384
2432
1
99.9
2.25-2.39
0.218
6.4
9541
2490
1
100
2.39-2.58
0.17
8
9892
2550
1
100
2.58-2.84
0.121
10.9
9645
2498
1
99.9
2.84-3.25
0.07
18.3
9679
2500
1
99.9
3.25-4.08
0.035
32.9
9503
2450
1
99.9
4.08-28.52
0.025
44.3
9802
2527
1
99.5
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.5.0102
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.9→28.52 Å / Cor.coef. Fo:Fc: 0.956 / Cor.coef. Fo:Fc free: 0.939 / Occupancy max: 1 / Occupancy min: 0.22 / SU B: 6.211 / SU ML: 0.085 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.136 / ESU R Free: 0.135 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 4. ONE SUCCINIC ACID (SIN) WAS MODELED IN THE PUTATIVE ACTIVE SITE BASED ON THE PRESENCE OF CLEAR AND CONCLUSIVE ELECTRON DENSITY. 5. ONE ETHYLENE GLYCOL (EDO) MOLECULE FROM CRYSTALLIZATION IS MODELED INTO THE STRUCTURE.
Rfactor
反射数
%反射
Selection details
Rfree
0.227
668
4.9 %
RANDOM
Rwork
0.181
-
-
-
obs
0.183
13563
99.87 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK