モノクロメーター: Single crystal Si(111) bent monochromator (horizontal focusing) プロトコル: MAD / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
ID
波長 (Å)
相対比
1
0.97925
1
2
0.91837
1
3
0.97898
1
反射
解像度: 2.06→72.83 Å / Num. obs: 49880 / % possible obs: 99.4 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 37.087 Å2 / Rmerge(I) obs: 0.083 / Net I/σ(I): 10.62
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
2.06-2.13
0.639
2
17675
4716
1
99.7
2.13-2.22
0.488
2.7
19838
5254
1
99.5
2.22-2.32
0.375
3.5
18619
4933
1
99.8
2.32-2.44
0.3
4.2
18442
4869
1
99.7
2.44-2.59
0.233
5.3
18715
4943
1
99.6
2.59-2.79
0.165
7.4
18956
4999
1
99.7
2.79-3.07
0.105
10.9
19105
5031
1
99.4
3.07-3.52
0.062
16.6
19209
5066
1
99.5
3.52-4.42
0.041
24.1
18734
4967
1
99
4.42-72.83
0.039
28.7
18792
5087
1
98.4
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.5.0102
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2.06→72.83 Å / Cor.coef. Fo:Fc: 0.96 / Cor.coef. Fo:Fc free: 0.941 / Occupancy max: 1 / Occupancy min: 0.3 / SU B: 8.988 / SU ML: 0.108 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.161 / ESU R Free: 0.149 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 3. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 4. SULFATE (SO4) AND CHLORIDE (CL) MODELED WERE PRESENT IN CRYSTLLIZATION CONDITIONS OR IN PROTEIN BUFFER.
Rfactor
反射数
%反射
Selection details
Rfree
0.218
2529
5.1 %
RANDOM
Rwork
0.18
-
-
-
obs
0.182
49880
99.78 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK