ソフトウェア | 名称 | バージョン | 分類 |
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SBC-Collect | | データ収集 | HKL-3000 | | 位相決定 | MLPHARE | | 位相決定 | 直接法 | | モデル構築 | SHELXD | | 位相決定 | RESOLVE | | モデル構築 | ARP/wARP | | モデル構築 | Coot | | モデル構築 | REFMAC | 5.5.0054精密化 | HKL-3000 | | データ削減 | HKL-3000 | | データスケーリング | 直接法 | | 位相決定 | RESOLVE | | 位相決定 | |
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精密化 | 構造決定の手法: 単波長異常分散 / 解像度: 2.79→50 Å / Cor.coef. Fo:Fc: 0.946 / Cor.coef. Fo:Fc free: 0.915 / SU B: 30.613 / SU ML: 0.285 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R: 0.859 / ESU R Free: 0.37 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
| Rfactor | 反射数 | %反射 | Selection details |
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Rfree | 0.27565 | 639 | 4.9 % | RANDOM |
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Rwork | 0.21229 | - | - | - |
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obs | 0.21557 | 12407 | 99.44 % | - |
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all | - | 12476 | - | - |
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溶媒の処理 | イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK |
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原子変位パラメータ | Biso mean: 58.172 Å2
| Baniso -1 | Baniso -2 | Baniso -3 |
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1- | -3.92 Å2 | 0 Å2 | 0 Å2 |
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2- | - | -3.92 Å2 | 0 Å2 |
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3- | - | - | 7.84 Å2 |
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精密化ステップ | サイクル: LAST / 解像度: 2.79→50 Å
| タンパク質 | 核酸 | リガンド | 溶媒 | 全体 |
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原子数 | 2718 | 0 | 12 | 31 | 2761 |
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拘束条件 | Refine-ID | タイプ | Dev ideal | Dev ideal target | 数 |
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X-RAY DIFFRACTION | r_bond_refined_d0.014 | 0.022 | 2767 | X-RAY DIFFRACTION | r_bond_other_d | | | X-RAY DIFFRACTION | r_angle_refined_deg1.528 | 1.969 | 3712 | X-RAY DIFFRACTION | r_angle_other_deg | | | X-RAY DIFFRACTION | r_dihedral_angle_1_deg6.059 | 5 | 334 | X-RAY DIFFRACTION | r_dihedral_angle_2_deg33.249 | 23.582 | 134 | X-RAY DIFFRACTION | r_dihedral_angle_3_deg18.346 | 15 | 525 | X-RAY DIFFRACTION | r_dihedral_angle_4_deg16.663 | 15 | 24 | X-RAY DIFFRACTION | r_chiral_restr0.095 | 0.2 | 405 | X-RAY DIFFRACTION | r_gen_planes_refined0.006 | 0.02 | 2050 | X-RAY DIFFRACTION | r_gen_planes_other | | | X-RAY DIFFRACTION | r_nbd_refined | | | X-RAY DIFFRACTION | r_nbd_other | | | X-RAY DIFFRACTION | r_nbtor_refined | | | X-RAY DIFFRACTION | r_nbtor_other | | | X-RAY DIFFRACTION | r_xyhbond_nbd_refined | | | X-RAY DIFFRACTION | r_xyhbond_nbd_other | | | X-RAY DIFFRACTION | r_metal_ion_refined | | | X-RAY DIFFRACTION | r_metal_ion_other | | | X-RAY DIFFRACTION | r_symmetry_vdw_refined | | | X-RAY DIFFRACTION | r_symmetry_vdw_other | | | X-RAY DIFFRACTION | r_symmetry_hbond_refined | | | X-RAY DIFFRACTION | r_symmetry_hbond_other | | | X-RAY DIFFRACTION | r_symmetry_metal_ion_refined | | | X-RAY DIFFRACTION | r_symmetry_metal_ion_other | | | X-RAY DIFFRACTION | r_mcbond_it0.512 | 1.5 | 1673 | X-RAY DIFFRACTION | r_mcbond_other | | | X-RAY DIFFRACTION | r_mcangle_it1.023 | 2 | 2672 | X-RAY DIFFRACTION | r_scbond_it1.992 | 3 | 1094 | X-RAY DIFFRACTION | r_scangle_it3.281 | 4.5 | 1040 | X-RAY DIFFRACTION | r_rigid_bond_restr | | | X-RAY DIFFRACTION | r_sphericity_free | | | X-RAY DIFFRACTION | r_sphericity_bonded | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | | |
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LS精密化 シェル | 解像度: 2.79→2.863 Å / Total num. of bins used: 20
| Rfactor | 反射数 | %反射 |
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Rfree | 0.32 | 47 | - |
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Rwork | 0.24 | 840 | - |
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obs | - | - | 94.06 % |
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精密化 TLS | 手法: refined / Refine-ID: X-RAY DIFFRACTION ID | L11 (°2) | L12 (°2) | L13 (°2) | L22 (°2) | L23 (°2) | L33 (°2) | S11 (Å °) | S12 (Å °) | S13 (Å °) | S21 (Å °) | S22 (Å °) | S23 (Å °) | S31 (Å °) | S32 (Å °) | S33 (Å °) | T11 (Å2) | T12 (Å2) | T13 (Å2) | T22 (Å2) | T23 (Å2) | T33 (Å2) | Origin x (Å) | Origin y (Å) | Origin z (Å) |
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1 | 2.2412 | -1.2679 | -0.7378 | 4.6306 | 1.2594 | 2.9688 | 0.0743 | 0.2603 | 0.1867 | -0.6247 | 0.0089 | -0.2001 | -0.2109 | -0.2054 | -0.0832 | 0.1338 | -0.011 | -0.0058 | 0.0457 | 0.018 | 0.0348 | 19.9834 | 58.2636 | 6.5454 | 2 | 2.0686 | 0.2542 | 0.8482 | 4.0733 | 0.906 | 2.9174 | 0.0244 | -0.2844 | -0.1576 | 0.8283 | 0.2796 | -0.275 | 0.408 | -0.2599 | -0.3039 | 0.229 | 0.0567 | -0.0621 | 0.089 | 0.0149 | 0.0892 | 22.0738 | 36.1963 | 22.1032 |
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精密化 TLSグループ | ID | Refine-ID | Refine TLS-ID | Auth asym-ID | Auth seq-ID |
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1 | X-RAY DIFFRACTION | 1 | A10 - 219 | 2 | X-RAY DIFFRACTION | 2 | B10 - 219 | | |
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