- PDB-3eqx: CRYSTAL STRUCTURE OF A FIC FAMILY PROTEIN (SO_4266) FROM SHEWANEL... -
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基本情報
登録情報
データベース: PDB / ID: 3eqx
タイトル
CRYSTAL STRUCTURE OF A FIC FAMILY PROTEIN (SO_4266) FROM SHEWANELLA ONEIDENSIS AT 1.6 A RESOLUTION
要素
FIC DOMAIN CONTAINING TRANSCRIPTIONAL REGULATOR
キーワード
DNA BINDING PROTEIN / FIC FAMILY PROTEIN / STRUCTURAL GENOMICS / JOINT CENTER FOR STRUCTURAL GENOMICS / JCSG / PROTEIN STRUCTURE INITIATIVE / PSI-2
機能・相同性
機能・相同性情報
AMPylase activity / protein adenylylation / protein adenylyltransferase / magnesium ion binding / protein homodimerization activity / ATP binding 類似検索 - 分子機能
Fic/DOC N-terminal / Protein adenylyltransferase SoFic-like / : / Fic/DOC family N-terminal / Protein adenylyltransferase SoFic-like, C-terminal domain / Fido domain-containing protein / Fido-like domain superfamily / Fic/DOC family / Fido domain / Fido domain profile. 類似検索 - ドメイン・相同性
TRIETHYLENE GLYCOL / Protein adenylyltransferase SoFic 類似検索 - 構成要素
THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH ...THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE. DNA SEQUENCING OF THE CLONED CONSTRUCT SHOWS A CYSTEINE AT POSITION 109 INSTEAD OF A GLYCINE. THE CYSTEINE AT POSITION 109 IS SUPPORTED BY THE ELECTRON DENSITY.
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.36 Å3/Da / 溶媒含有率: 47.95 %
結晶化
温度: 277 K / 手法: 蒸気拡散法, シッティングドロップ法 / pH: 7.1 詳細: 0.2M NaF, 20.0% PEG-3350, No Buffer pH 7.1, NANODROP, VAPOR DIFFUSION, SITTING DROP, temperature 277K
モノクロメーター: Single crystal Si(111) bent monochromator (horizontal focusing) プロトコル: MAD / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
ID
波長 (Å)
相対比
1
0.91837
1
2
0.97905
1
3
0.97935
1
反射
解像度: 1.6→29.553 Å / Num. obs: 106471 / % possible obs: 98.7 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 19.465 Å2 / Rmerge(I) obs: 0.042 / Net I/σ(I): 13.83
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
1.6-1.66
0.524
2
37525
21263
1
98.7
1.66-1.72
0.415
2.4
33144
18630
1
99.7
1.72-1.8
0.327
3.1
37611
21027
1
99.6
1.8-1.9
0.234
4.3
38912
21626
1
99.7
1.9-2.02
0.158
6.3
37195
20547
1
99.5
2.02-2.17
0.102
9.4
35933
19785
1
99.7
2.17-2.39
0.066
13.9
37908
20659
1
99.3
2.39-2.73
0.043
20
37476
20049
1
98.7
2.73-3.44
0.026
29.6
38826
20295
1
97.7
3.44-29.553
0.015
48.8
38572
19736
1
94.9
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位相決定
位相決定
手法: 多波長異常分散
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解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.2.0019
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
SOLVE
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.6→29.553 Å / Cor.coef. Fo:Fc: 0.966 / Cor.coef. Fo:Fc free: 0.955 / Occupancy max: 1 / Occupancy min: 0.25 / SU B: 3.098 / SU ML: 0.055 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.084 / ESU R Free: 0.083 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 TO ACCOUNT FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION 3. ATOM RECORD CONTAINS RESIDUAL B FACTORS ONLY. 4. MODELING EXPERIMENTS SUGGEST THAT THE ELECTRON DENSITY NEAR THE HPFXXGNG MOTIF (PRESENT IN FIC PROTEINS) STARTING AT HIS198 IN CHAIN A IS LIKELY TO BE A PORTION (B1-B4) OF THE PARTIALLY MISSING N-TERMINUS OF CHAIN B FROM A SYMMETRY RELATED MOLECULE. B1(MSE) IS SUPPORTED BY A SIGNIGICANT PEAK IN THE ANOMALOUS DIFFERENCE FOURIER MAP CALCULATED FOR THIS SELENOMETHIONINE DERIVATIZED PROTEIN CRYSTAL. 5. PGE HAS BEEN MODELED BASED ON CRYSTALLIZATION CONDITIONS. 6. RESIDUES A344-A345 IN CHAIN A AND B5-B10 ARE DISORDERED AND HAVE NOT BEEN MODELLED.
Rfactor
反射数
%反射
Selection details
Rfree
0.197
5304
5 %
RANDOM
Rwork
0.168
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-
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obs
0.17
106418
99.32 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK