モノクロメーター: Single crystal Si(111) bent (horizontal focusing) プロトコル: MAD / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
ID
波長 (Å)
相対比
1
0.92522
1
2
0.97922
1
3
0.97464
1
反射
解像度: 2.09→26.528 Å / Num. obs: 9659 / % possible obs: 97.6 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 44.118 Å2 / Rmerge(I) obs: 0.052 / Net I/σ(I): 15.3
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
2.09-2.16
0.902
1.6
4806
1296
1
77.8
2.16-2.25
0.67
2.2
7068
1841
1
99.6
2.25-2.35
0.522
2.8
6573
1718
1
99.5
2.35-2.48
0.357
4
7064
1836
1
99.6
2.48-2.63
0.218
6.2
6598
1713
1
99.9
2.63-2.83
0.138
9.5
6746
1751
1
99.9
2.83-3.12
0.077
15.5
6986
1804
1
99.9
3.12-3.57
0.042
25.3
6817
1761
1
99.9
3.57-4.49
0.028
37.1
6793
1766
1
99.9
4.49-26.528
0.023
45
6874
1793
1
98.8
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.4.0067
精密化
PHENIX
精密化
SHELX
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.004
データ抽出
MAR345
CCD
データ収集
XDS
データ削減
SHARP
位相決定
SHELXD
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2.1→26.528 Å / Cor.coef. Fo:Fc: 0.952 / Cor.coef. Fo:Fc free: 0.946 / SU B: 12.209 / SU ML: 0.165 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.233 / ESU R Free: 0.187 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 3. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 4. X-RAY FLUORESCENCE EXCITATION, WAVELENGTH SCANS AND ANOMALOUS DIFFERENCE FOURIERS SUPPORT THE MODELING OF ZN ION. 5. AN UNKNOWN LIGAND (UNL) HAS BEEN MODELED NEAR THE ZN ION SITE.
Rfactor
反射数
%反射
Selection details
Rfree
0.246
461
4.8 %
RANDOM
Rwork
0.216
-
-
-
obs
0.217
9609
99.59 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: BABINET MODEL WITH MASK
原子変位パラメータ
Biso mean: 46.793 Å2
Baniso -1
Baniso -2
Baniso -3
1-
0.91 Å2
0 Å2
0 Å2
2-
-
0.91 Å2
0 Å2
3-
-
-
-1.82 Å2
精密化ステップ
サイクル: LAST / 解像度: 2.1→26.528 Å
タンパク質
核酸
リガンド
溶媒
全体
原子数
1093
0
27
28
1148
拘束条件
Refine-ID
タイプ
Dev ideal
Dev ideal target
数
X-RAY DIFFRACTION
r_bond_refined_d
0.015
0.021
1158
X-RAY DIFFRACTION
r_bond_other_d
0.003
0.02
806
X-RAY DIFFRACTION
r_angle_refined_deg
1.918
1.947
1570
X-RAY DIFFRACTION
r_angle_other_deg
1.558
3
1951
X-RAY DIFFRACTION
r_dihedral_angle_1_deg
2.362
5
134
X-RAY DIFFRACTION
r_dihedral_angle_2_deg
28.207
23.387
62
X-RAY DIFFRACTION
r_dihedral_angle_3_deg
11.879
15
181
X-RAY DIFFRACTION
r_dihedral_angle_4_deg
11.773
15
8
X-RAY DIFFRACTION
r_chiral_restr
0.109
0.2
163
X-RAY DIFFRACTION
r_gen_planes_refined
0.007
0.021
1278
X-RAY DIFFRACTION
r_gen_planes_other
0.003
0.02
251
X-RAY DIFFRACTION
r_mcbond_it
1.201
2
665
X-RAY DIFFRACTION
r_mcbond_other
0.244
2
269
X-RAY DIFFRACTION
r_mcangle_it
2.184
4
1071
X-RAY DIFFRACTION
r_scbond_it
4.231
6
493
X-RAY DIFFRACTION
r_scangle_it
6.126
8
498
LS精密化 シェル
解像度: 2.1→2.16 Å / Total num. of bins used: 20
Rfactor
反射数
%反射
Rfree
0.273
42
-
Rwork
0.279
647
-
all
-
689
-
obs
-
-
98.01 %
精密化 TLS
手法: refined / Origin x: 21.841 Å / Origin y: 19.915 Å / Origin z: 22.591 Å