ENGINEERED RESIDUE IN CHAIN A, ALA 366 TO GLY ENGINEERED RESIDUE IN CHAIN A, VAL 367 TO ALA ...ENGINEERED RESIDUE IN CHAIN A, ALA 366 TO GLY ENGINEERED RESIDUE IN CHAIN A, VAL 367 TO ALA ENGINEERED RESIDUE IN CHAIN A, PRO 368 TO MET ENGINEERED RESIDUE IN CHAIN A, GLU 369 TO PHE ENGINEERED RESIDUE IN CHAIN A, VAL 370 TO LEU ENGINEERED RESIDUE IN CHAIN A, GLU 371 TO GLU ENGINEERED RESIDUE IN CHAIN A, LEU 372 TO ALA ENGINEERED RESIDUE IN CHAIN A, SER 373 TO ILE ENGINEERED RESIDUE IN CHAIN A, ASP 374 TO PRO ENGINEERED RESIDUE IN CHAIN A, GLN 375 TO ARG ENGINEERED RESIDUE IN CHAIN A, PRO 376 TO SER ENGINEERED RESIDUE IN CHAIN A, GLU 377 TO ILE
解像度: 1.7→86.44 Å / Cor.coef. Fo:Fc: 0.94 / Cor.coef. Fo:Fc free: 0.928 / SU B: 5.181 / SU ML: 0.079 / 交差検証法: THROUGHOUT / ESU R: 0.127 / ESU R Free: 0.118 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.23208
2166
5.1 %
RANDOM
Rwork
0.2043
-
-
-
obs
0.20574
40382
92.01 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK