A: REPLICATION PROTEIN E1 B: REPLICATION PROTEIN E1 C: REPLICATION PROTEIN E1 D: REPLICATION PROTEIN E1 E: REPLICATION PROTEIN E1 F: REPLICATION PROTEIN E1 G: REPLICATION PROTEIN E1 H: REPLICATION PROTEIN E1 I: REPLICATION PROTEIN E1 J: REPLICATION PROTEIN E1 K: REPLICATION PROTEIN E1 L: REPLICATION PROTEIN E1 ヘテロ分子
A: REPLICATION PROTEIN E1 B: REPLICATION PROTEIN E1 C: REPLICATION PROTEIN E1 D: REPLICATION PROTEIN E1 E: REPLICATION PROTEIN E1 F: REPLICATION PROTEIN E1 ヘテロ分子
G: REPLICATION PROTEIN E1 H: REPLICATION PROTEIN E1 I: REPLICATION PROTEIN E1 J: REPLICATION PROTEIN E1 K: REPLICATION PROTEIN E1 L: REPLICATION PROTEIN E1 ヘテロ分子
解像度: 3→24.95 Å / Cor.coef. Fo:Fc: 0.939 / Cor.coef. Fo:Fc free: 0.904 / SU B: 48.189 / SU ML: 0.385 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / ESU R Free: 0.461 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.271
853
1 %
RANDOM
Rwork
0.219
-
-
-
obs
0.219
85189
93.4 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK