CD2-ASSOCIATEDPROTEIN / CAS LIGAND WITH MULTIPLE SH3 DOMAINS / ADAPTER PROTEIN CMS
分子量: 7412.285 Da / 分子数: 1 / 断片: SH3, RESIDUES 1-62 / 由来タイプ: 組換発現 詳細: N-TERMINAL SH3 DOMAIN (SH3A) OF CD2- ASSOCIATED PROTEIN (CD2AP)OR CAS LIGAND WITH MULTIPLE SRC HOMOLOGY 3 DOMAINS (CMS) 由来: (組換発現) HOMO SAPIENS (ヒト) / プラスミド: PET21A / 発現宿主: ESCHERICHIA COLI (大腸菌) / 株 (発現宿主): ROSETTA (DE3) PLYS / 参照: UniProt: Q9Y5K6
#2: タンパク質・ペプチド
E3UBIQUITIN-PROTEINLIGASECBL-B / CAS-BR-M MURINE ECTROPIC RETROVIRAL TRANSFORMING SEQUENCE B / CBL-B / SIGNAL TRANSDUCTION PROTEIN ...CAS-BR-M MURINE ECTROPIC RETROVIRAL TRANSFORMING SEQUENCE B / CBL-B / SIGNAL TRANSDUCTION PROTEIN CBL-B / SH3-BINDING PROTEIN CBL-B / CASITAS B-LINEAGE LYMPHOMA PROTO-ONCOGENE B / RING FINGER PROTEIN 56
分子量: 1332.622 Da / 分子数: 1 / 断片: PEPTIDE, RESIDUES 902-912 / 由来タイプ: 合成 詳細: A.A. 902 TO 912 FROM CAS-BR-M (MURINE) ECTROPIC RETROVIRAL TRANSFORMING SEQUENCE B (CBL-B) 由来: (合成) HOMO SAPIENS (ヒト) 参照: UniProt: Q13191, 合成酵素; C-N結合を形成; 酸-D-アミノ酸リガーゼ(ペプチド合成)
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 1.54179 Å / 相対比: 1
反射
解像度: 1.7→20 Å / Num. obs: 8678 / % possible obs: 99.9 % / Observed criterion σ(I): 3 / 冗長度: 12.33 % / Biso Wilson estimate: 33 Å2 / Rmerge(I) obs: 0.03 / Net I/σ(I): 20.9
反射 シェル
解像度: 1.7→1.76 Å / Rmerge(I) obs: 0.27 / Mean I/σ(I) obs: 6.9 / % possible all: 100
-
解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.2.0019
精密化
DENZO
データ削減
SCALEPACK
データスケーリング
AMoRE
位相決定
精密化
構造決定の手法: 分子置換 / 解像度: 1.7→19.32 Å / Cor.coef. Fo:Fc: 0.957 / Cor.coef. Fo:Fc free: 0.942 / SU B: 4.084 / SU ML: 0.07 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.112 / ESU R Free: 0.107 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.REFINENEMENT WAS INITIATED WITH CNS V1.1 AND PURSUED WITH REFMAC 5 DISORDERED ATOMS IN SIDE CHAIN S WHERE GIVEN AN OCCUPANCY CG LYS A 31, CD ...詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.REFINENEMENT WAS INITIATED WITH CNS V1.1 AND PURSUED WITH REFMAC 5 DISORDERED ATOMS IN SIDE CHAIN S WHERE GIVEN AN OCCUPANCY CG LYS A 31, CD LYS A 31, CE LYS A 31, NZ LYS A 31, CD GLU A 39, OE1 GLU A 39, OE2 GLU A 39, CE BMET A 48
Rfactor
反射数
%反射
Selection details
Rfree
0.218
465
5.44 %
RANDOM
Rwork
0.19
-
-
-
obs
0.192
8557
98.3 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: BABINET MODEL PLUS MASK