A: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 B: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 ヘテロ分子
A: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 B: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 ヘテロ分子
A: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 B: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 ヘテロ分子
A: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 B: A hexameric barrel state of a de novo coiled-coil assembly: CC-Type2-(QgLaId)4 ヘテロ分子
構造決定の手法: AB INITIO PHASING / 解像度: 1.35→32.85 Å / Cor.coef. Fo:Fc: 0.962 / Cor.coef. Fo:Fc free: 0.968 / SU B: 2.992 / SU ML: 0.053 / SU R Cruickshank DPI: 0.0695 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.07 / ESU R Free: 0.058 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS U VALUES : WITH TLS ADDED
Rfactor
反射数
%反射
Selection details
Rfree
0.1937
565
5.1 %
RANDOM
Rwork
0.1743
-
-
-
obs
0.1753
10446
99.75 %
-
溶媒の処理
イオンプローブ半径: 0.7 Å / 減衰半径: 0.7 Å / VDWプローブ半径: 1.3 Å / 溶媒モデル: MASK