- PDB-7pk4: Tick salivary cystatin Ricistatin in complex with cathepsin V -
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データを開く
IDまたはキーワード:
読み込み中...
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基本情報
登録情報
データベース: PDB / ID: 7pk4
タイトル
Tick salivary cystatin Ricistatin in complex with cathepsin V
要素
Cathepsin L2
Putative salivary cystatin
キーワード
HYDROLASE / Complex / cystatin / tick
機能・相同性
機能・相同性情報
cathepsin V / RUNX1 regulates transcription of genes involved in differentiation of keratinocytes / Trafficking and processing of endosomal TLR / Assembly of collagen fibrils and other multimeric structures / cysteine-type endopeptidase inhibitor activity / Activation of Matrix Metalloproteinases / cysteine-type endopeptidase activator activity involved in apoptotic process / extracellular matrix disassembly / cysteine-type peptidase activity / MHC class II antigen presentation ...cathepsin V / RUNX1 regulates transcription of genes involved in differentiation of keratinocytes / Trafficking and processing of endosomal TLR / Assembly of collagen fibrils and other multimeric structures / cysteine-type endopeptidase inhibitor activity / Activation of Matrix Metalloproteinases / cysteine-type endopeptidase activator activity involved in apoptotic process / extracellular matrix disassembly / cysteine-type peptidase activity / MHC class II antigen presentation / Degradation of the extracellular matrix / lysosomal lumen / positive regulation of apoptotic signaling pathway / proteolysis involved in protein catabolic process / Endosomal/Vacuolar pathway / antigen processing and presentation of exogenous peptide antigen via MHC class II / immune response / serine-type endopeptidase activity / cysteine-type endopeptidase activity / extracellular space / extracellular region 類似検索 - 分子機能
解像度: 1.92→43.87 Å / Cor.coef. Fo:Fc: 0.956 / Cor.coef. Fo:Fc free: 0.94 / SU B: 4.84 / SU ML: 0.128 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.166 / ESU R Free: 0.149 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS U VALUES : REFINED INDIVIDUALLY
Rfactor
反射数
%反射
Selection details
Rfree
0.2261
1153
4.9 %
RANDOM
Rwork
0.1859
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obs
0.1878
22253
99.07 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK