morphogenesis of an epithelium / non-specific serine/threonine protein kinase / protein serine kinase activity / protein serine/threonine kinase activity / ATP binding / membrane / cytoplasm 類似検索 - 分子機能
Ankyrin repeats (many copies) / Ankyrin repeats (3 copies) / Ankyrin repeat profile. / Ankyrin repeat region circular profile. / ankyrin repeats / Ankyrin repeat / Ankyrin repeat-containing domain superfamily / Transferase(Phosphotransferase) domain 1 / Transferase(Phosphotransferase); domain 1 / Serine/threonine-protein kinase, active site ...Ankyrin repeats (many copies) / Ankyrin repeats (3 copies) / Ankyrin repeat profile. / Ankyrin repeat region circular profile. / ankyrin repeats / Ankyrin repeat / Ankyrin repeat-containing domain superfamily / Transferase(Phosphotransferase) domain 1 / Transferase(Phosphotransferase); domain 1 / Serine/threonine-protein kinase, active site / Serine/Threonine protein kinases active-site signature. / Protein kinase domain / Serine/Threonine protein kinases, catalytic domain / Protein kinase, ATP binding site / Protein kinases ATP-binding region signature. / Protein kinase domain profile. / Protein kinase domain / Protein kinase-like domain superfamily / Orthogonal Bundle / Mainly Alpha 類似検索 - ドメイン・相同性
Receptor-interactingserine/threonine-proteinkinase4 / Ankyrin repeat domain-containing protein 3 / PKC-associated protein kinase / PKC-regulated protein kinase
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 1 Å / 相対比: 1
反射
解像度: 2.5→30 Å / Num. obs: 37451 / % possible obs: 99.9 % / 冗長度: 4.8 % / Rmerge(I) obs: 0.053 / Net I/σ(I): 27.1
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.8.0158
精密化
HKL-2000
データ削減
HKL-2000
データスケーリング
PHASER
位相決定
精密化
構造決定の手法: 分子置換 / 解像度: 2.5→30 Å / Cor.coef. Fo:Fc: 0.944 / Cor.coef. Fo:Fc free: 0.933 / SU B: 7.835 / SU ML: 0.17 / 交差検証法: THROUGHOUT / ESU R: 0.258 / ESU R Free: 0.219 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.25595
969
4.9 %
RANDOM
Rwork
0.2225
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obs
0.22414
18843
99.63 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK