CDC6 association with the ORC:origin complex / origin recognition complex / E2F-enabled inhibition of pre-replication complex formation / nuclear origin of replication recognition complex / inner kinetochore / DNA replication origin binding / Activation of the pre-replicative complex / DNA replication initiation / heterochromatin / Activation of ATR in response to replication stress ...CDC6 association with the ORC:origin complex / origin recognition complex / E2F-enabled inhibition of pre-replication complex formation / nuclear origin of replication recognition complex / inner kinetochore / DNA replication origin binding / Activation of the pre-replicative complex / DNA replication initiation / heterochromatin / Activation of ATR in response to replication stress / Assembly of the ORC complex at the origin of replication / Assembly of the pre-replicative complex / Orc1 removal from chromatin / chromosome, telomeric region / centrosome / negative regulation of transcription by RNA polymerase II / nucleoplasm / membrane / nucleus 類似検索 - 分子機能
解像度: 2.01→47.66 Å / Cor.coef. Fo:Fc: 0.958 / Cor.coef. Fo:Fc free: 0.918 / WRfactor Rfree: 0.2429 / WRfactor Rwork: 0.1825 / FOM work R set: 0.8216 / SU B: 9.777 / SU ML: 0.132 / SU R Cruickshank DPI: 0.1792 / SU Rfree: 0.1801 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.179 / ESU R Free: 0.18 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: Data were reduced with HKL3000 for structure solution and early refinement. Molecular replacement was followed by simulated annealing refinement with PHENIX, subsequent phase improvement and ...詳細: Data were reduced with HKL3000 for structure solution and early refinement. Molecular replacement was followed by simulated annealing refinement with PHENIX, subsequent phase improvement and automated model buidling with ARP/WARP. Diffraction data were reduced with XDS/AIMLESS for later refinement steps.
Rfactor
反射数
%反射
Selection details
Rfree
0.2573
837
9.7 %
RANDOM
Rwork
0.1896
7833
-
-
obs
0.196
8670
99.85 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK