ジャーナル: Cell / 年: 2015 タイトル: Structural Insights into Bunyavirus Replication and Its Regulation by the vRNA Promoter. 著者: Piotr Gerlach / Hélène Malet / Stephen Cusack / Juan Reguera / 要旨: Segmented negative-strand RNA virus (sNSV) polymerases transcribe and replicate the viral RNA (vRNA) within a ribonucleoprotein particle (RNP). We present cryo-EM and X-ray structures of, ...Segmented negative-strand RNA virus (sNSV) polymerases transcribe and replicate the viral RNA (vRNA) within a ribonucleoprotein particle (RNP). We present cryo-EM and X-ray structures of, respectively, apo- and vRNA bound La Crosse orthobunyavirus (LACV) polymerase that give atomic-resolution insight into how such RNPs perform RNA synthesis. The complementary 3' and 5' vRNA extremities are sequence specifically bound in separate sites on the polymerase. The 5' end binds as a stem-loop, allosterically structuring functionally important polymerase active site loops. Identification of distinct template and product exit tunnels allows proposal of a detailed model for template-directed replication with minimal disruption to the circularised RNP. The similar overall architecture and vRNA binding of monomeric LACV to heterotrimeric influenza polymerase, despite high sequence divergence, suggests that all sNSV polymerases have a common evolutionary origin and mechanism of RNA synthesis. These results will aid development of replication inhibitors of diverse, serious human pathogenic viruses.
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.97924 Å / 相対比: 1
反射
解像度: 3→50 Å / Num. obs: 48549 / % possible obs: 99.5 % / Observed criterion σ(I): 3 / 冗長度: 4.32 % / Rmerge(I) obs: 0.01 / Net I/σ(I): 11.91
反射 シェル
解像度: 3→3.12 Å / 冗長度: 4.52 % / Rmerge(I) obs: 0.08 / Mean I/σ(I) obs: 1.55 / % possible all: 99.5
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解析
ソフトウェア
名称
バージョン
分類
REFMAC
5.8.0103
精密化
XDS
データ削減
XSCALE
データスケーリング
PHASER
位相決定
精密化
構造決定の手法: 分子置換 / 解像度: 3→49.17 Å / Cor.coef. Fo:Fc: 0.953 / Cor.coef. Fo:Fc free: 0.913 / SU B: 23.315 / SU ML: 0.387 / 交差検証法: THROUGHOUT / ESU R Free: 0.431 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. THE DISORDERED RESIDUES HAVE BEEN DELETED FROM THE PDB
Rfactor
反射数
%反射
Selection details
Rfree
0.25242
2407
5 %
RANDOM
Rwork
0.19228
-
-
-
obs
0.19516
46142
99.05 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK