- PDB-4ldb: Crystal Structure of Ebola Virus VP40 Dimer -
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基本情報
登録情報
データベース: PDB / ID: 4ldb
タイトル
Crystal Structure of Ebola Virus VP40 Dimer
要素
Matrix protein VP40
キーワード
VIRAL PROTEIN / viral matrix protein / viral budding / assembly / viral transcription regulation
機能・相同性
機能・相同性情報
intracellular transport of virus / host cell endomembrane system / symbiont-mediated suppression of host defenses / symbiont-mediated suppression of host RNAi-mediated antiviral immune response / host cell late endosome membrane / viral budding / viral budding via host ESCRT complex / host cell membrane / viral budding from plasma membrane / host cell ...intracellular transport of virus / host cell endomembrane system / symbiont-mediated suppression of host defenses / symbiont-mediated suppression of host RNAi-mediated antiviral immune response / host cell late endosome membrane / viral budding / viral budding via host ESCRT complex / host cell membrane / viral budding from plasma membrane / host cell / structural constituent of virion / ribonucleoprotein complex / membrane raft / virus-mediated perturbation of host defense response / host cell plasma membrane / virion membrane / RNA binding / extracellular region / identical protein binding 類似検索 - 分子機能
EV matrix protein / Matrix protein VP40, N-terminal domain / EV matrix protein fold / EV matrix protein, C-terminal / EV matrix protein / EV matrix domain superfamily / EV matrix protein, N-terminal / Matrix protein VP40 / Topoisomerase I; domain 3 / Distorted Sandwich ...EV matrix protein / Matrix protein VP40, N-terminal domain / EV matrix protein fold / EV matrix protein, C-terminal / EV matrix protein / EV matrix domain superfamily / EV matrix protein, N-terminal / Matrix protein VP40 / Topoisomerase I; domain 3 / Distorted Sandwich / Sandwich / Mainly Beta 類似検索 - ドメイン・相同性
構造決定の手法: 分子置換 / 解像度: 3.1→50 Å / Cor.coef. Fo:Fc: 0.906 / Cor.coef. Fo:Fc free: 0.872 / SU B: 23.564 / SU ML: 0.425 / 交差検証法: THROUGHOUT / ESU R Free: 0.513 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS U VALUES : REFINED INDIVIDUALLY
Rfactor
反射数
%反射
Selection details
Rfree
0.282
1218
5.1 %
RANDOM
Rwork
0.245
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obs
0.24693
22689
99.97 %
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all
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24108
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK