温度: 277.15 K / 手法: 蒸気拡散法, ハンギングドロップ法 / pH: 4.6 詳細: Crystallization screens were conducted using 1:1 sitting drops at RT and 4 C. The C-terminal domain (137-322) (~20mg/mL) gave large rectangular crystals in 1.15M LiSO4, 0.1M NaOAc, pH 4.6 (4 ...詳細: Crystallization screens were conducted using 1:1 sitting drops at RT and 4 C. The C-terminal domain (137-322) (~20mg/mL) gave large rectangular crystals in 1.15M LiSO4, 0.1M NaOAc, pH 4.6 (4 C) when optimized (1:1 hanging drops). However these were very fragile and consisted of multiple lattices overlaid on each other as observed in their diffraction patterns. SseI 137-322 was then reductively methylated and rescreened. It gave multiple crystals of differing morphologies in a number of conditions containing MES, Tris, and HEPES buffers pH 6.0 - 9.0, and 1.6 to 2.0M (NH4)SO4. To obtain single crystals, crystals from 0.1M MES pH 7.1, 1.8M (NH4)SO4 were crushed and microseeded into pre-equilibrated (2 hrs) drops containing protein/reservoir solution (0.1M MES pH 5.5, 1.6M (NH4)SO4). This procedure produced single, small, rectangular crystals. To obtain larger crystals, single crystals obtained in the previous step were macroseeded into pre-equilibrated drops, giving large, thin rectangular plates that were well-diffracting. SeMet-substituted crystals of 137-322 were obtained in the same conditions but gave large crystals directly without any seeding. Crystals were then cryoprotected by transfer in small increments into mother liquor supplemented with 25% glycerol., VAPOR DIFFUSION, HANGING DROP, temperature 277.15K
プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 0.979 Å / 相対比: 1
反射
最高解像度: 1.7 Å / Num. obs: 19151
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解析
ソフトウェア
名称
バージョン
分類
HKL-2000
データ収集
REFMAC
5.5.0044
精密化
HKL-2000
データ削減
HKL-2000
データスケーリング
精密化
構造決定の手法: 単波長異常分散 / 解像度: 1.7→19.08 Å / Cor.coef. Fo:Fc: 0.957 / Cor.coef. Fo:Fc free: 0.947 / SU B: 4.345 / SU ML: 0.065 / 交差検証法: THROUGHOUT / ESU R: 0.106 / ESU R Free: 0.103 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.21364
1045
5.2 %
RANDOM
Rwork
0.18318
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-
-
obs
0.18469
19151
100 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK