THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH ...THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING GLY 0 FOLOWED BY RESIDUES 30-154 FOR EACH MONOMER OF THE TARGET SEQUENCE.
解像度: 1.35→27.96 Å / Num. obs: 45712 / % possible obs: 93.6 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 19.297 Å2 / Rmerge(I) obs: 0.027 / Net I/σ(I): 14.43
反射 シェル
Diffraction-ID: 1
解像度 (Å)
最高解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
% possible all
1.35-1.4
0.599
1.4
16877
8252
87.9
1.4-1.45
0.441
1.9
15868
7698
93.8
1.45-1.52
0.288
2.9
18852
9148
94.4
1.52-1.6
0.188
4.4
17803
8623
94.7
1.6-1.7
0.129
6.4
17919
8686
95.4
1.7-1.83
0.076
10.3
17790
8616
95.6
1.83-2.02
0.041
17.6
18352
8886
94.7
2.02-2.31
0.027
26
17614
8534
94.6
2.31-2.91
0.021
32
17890
8651
95.1
2.91
0.016
41.6
16686
8177
89.7
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
MolProbity
3beta29
モデル構築
PDB_EXTRACT
3.1
データ抽出
SHELX
位相決定
SHARP
位相決定
XSCALE
December6, 2010
データスケーリング
REFMAC
5.6.0116
精密化
XDS
データ削減
SHELXD
位相決定
autoSHARP
位相決定
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.35→27.96 Å / Cor.coef. Fo:Fc: 0.972 / Cor.coef. Fo:Fc free: 0.956 / Occupancy max: 1 / Occupancy min: 0.37 / SU B: 2.236 / SU ML: 0.041 / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R Free: 0.066 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED ...詳細: 1. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 2. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.2067
2302
5 %
RANDOM
Rwork
0.1567
-
-
-
obs
0.1592
45670
95.75 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK