toxin sequestering activity / sporulation resulting in formation of a cellular spore / plasma membrane 類似検索 - 分子機能
Alpha-Beta Plaits - #2720 / Antitoxin SpoIISB / Toxin SpoIISA, type II toxin-antitoxin system / Toxin SpoIISA, type II toxin-antitoxin system / Antitoxin SpoIISB, type II toxin-antitoxin system / Single helix bin / Single helix bin / Single alpha-helices involved in coiled-coils or other helix-helix interfaces / Alpha-Beta Plaits / Up-down Bundle ...Alpha-Beta Plaits - #2720 / Antitoxin SpoIISB / Toxin SpoIISA, type II toxin-antitoxin system / Toxin SpoIISA, type II toxin-antitoxin system / Antitoxin SpoIISB, type II toxin-antitoxin system / Single helix bin / Single helix bin / Single alpha-helices involved in coiled-coils or other helix-helix interfaces / Alpha-Beta Plaits / Up-down Bundle / 2-Layer Sandwich / Mainly Alpha / Alpha Beta 類似検索 - ドメイン・相同性
Stage II sporulation protein SB / Stage II sporulation protein SA 類似検索 - 構成要素
解像度: 2.25→2.29 Å / 冗長度: 5.5 % / Rmerge(I) obs: 0.682 / Mean I/σ(I) obs: 2.7 / Num. unique all: 388 / % possible all: 44.4
-
解析
ソフトウェア
名称
バージョン
分類
HKL-2000
データ収集
SHELXS
位相決定
REFMAC
5.6.0081
精密化
HKL-2000
データ削減
HKL-2000
データスケーリング
精密化
構造決定の手法: 多波長異常分散 / 解像度: 2.5→48.69 Å / Cor.coef. Fo:Fc: 0.954 / Cor.coef. Fo:Fc free: 0.918 / SU B: 23.834 / SU ML: 0.243 / 交差検証法: THROUGHOUT / ESU R Free: 0.333 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN USED IF PRESENT IN THE INPUT
Rfactor
反射数
%反射
Selection details
Rfree
0.25778
650
5 %
RANDOM
Rwork
0.19589
-
-
-
obs
0.19884
12265
98.81 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK
原子変位パラメータ
Biso mean: 62.135 Å2
Baniso -1
Baniso -2
Baniso -3
1-
-0.97 Å2
0 Å2
-0 Å2
2-
-
1.01 Å2
0 Å2
3-
-
-
-0.03 Å2
精密化ステップ
サイクル: LAST / 解像度: 2.5→48.69 Å
タンパク質
核酸
リガンド
溶媒
全体
原子数
3104
0
0
18
3122
拘束条件
Refine-ID
タイプ
Dev ideal
Dev ideal target
数
X-RAY DIFFRACTION
r_bond_refined_d
0.015
0.022
3185
X-RAY DIFFRACTION
r_bond_other_d
0.004
0.02
2151
X-RAY DIFFRACTION
r_angle_refined_deg
1.537
1.977
4319
X-RAY DIFFRACTION
r_angle_other_deg
1.201
3.002
5258
X-RAY DIFFRACTION
r_dihedral_angle_1_deg
6.524
5
376
X-RAY DIFFRACTION
r_dihedral_angle_2_deg
37.28
24.258
155
X-RAY DIFFRACTION
r_dihedral_angle_3_deg
18.626
15
583
X-RAY DIFFRACTION
r_dihedral_angle_4_deg
23.437
15
18
X-RAY DIFFRACTION
r_chiral_restr
0.092
0.2
491
X-RAY DIFFRACTION
r_gen_planes_refined
0.007
0.02
3452
X-RAY DIFFRACTION
r_gen_planes_other
0.004
0.02
634
LS精密化 シェル
解像度: 2.5→2.565 Å / Total num. of bins used: 20
Rfactor
反射数
%反射
Rfree
0.305
55
-
Rwork
0.258
825
-
obs
-
-
92.73 %
精密化 TLS
手法: refined / Origin x: -12.009 Å / Origin y: -3.77 Å / Origin z: 26.998 Å