THE STRUCTURE DOES NOT CONTAIN RESIDUES GLY220 TO ASP222 OF ORAE PRESENT IN THE UNP SEQUENCE. WE DO ...THE STRUCTURE DOES NOT CONTAIN RESIDUES GLY220 TO ASP222 OF ORAE PRESENT IN THE UNP SEQUENCE. WE DO NOT FIND ANY EVIDENCE FOR THESE RESIDUES FROM CLOSTRIDIUM STICKLANDII GENOMIC DNA SEQUENCING OR BY ALIGNMENT BETWEEN THE ORAE PROTEIN SEQUENCES FROM CLOSTRIDIUM STICKLANDII AND CLOSTRIDIUM DIFFICILE (ACCESSION NUMBER ZP_05349629; 79% SEQUENCE IDENTITY) WHICH ALSO SHOWS THAT THE CORRESPONDING ORAE CODING SEQUENCE FROM THE LATTER ORGANISM ALSO DOES NOT CONTAIN THE THREE AMINO ACID GID INSERT (A SIMILAR CONCLUSION CAN BE REACHED BY ALIGNMENT WITH VARIOUS THERMOANAEROBACTER SP)
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実験情報
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実験
実験
手法: X線回折 / 使用した結晶の数: 1
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試料調製
結晶
マシュー密度: 2.28 Å3/Da / 溶媒含有率: 45.97 %
結晶化
温度: 294 K / pH: 8 詳細: A protein solution (8 mg/ml 4,5-OAM, 5 mM 2-mercaptoethanol, 10 mM Tris HCl pH 8.0, 2 mM PLP, and 2 mM AdoCbl) was mixed in a 1:1 ratio with precipitant solution [(0.1 M Tris HCl, pH 8.0, 0.2 ...詳細: A protein solution (8 mg/ml 4,5-OAM, 5 mM 2-mercaptoethanol, 10 mM Tris HCl pH 8.0, 2 mM PLP, and 2 mM AdoCbl) was mixed in a 1:1 ratio with precipitant solution [(0.1 M Tris HCl, pH 8.0, 0.2 M MgCl2, 25 % (wt/vol) polyethylene glycol 2000 mono-methylether] under red light at room temperature., VAPOR DIFFUSION, SITTING DROP, temperature 294K
モノクロメーター: SAGITALLY FOCUSED SI(111) / プロトコル: SINGLE WAVELENGTH / 単色(M)・ラウエ(L): M / 散乱光タイプ: x-ray
放射波長
波長: 1.072 Å / 相対比: 1
反射
解像度: 2.9→120.86 Å / Num. obs: 72733 / % possible obs: 97.9 % / Observed criterion σ(I): 1 / Rmerge(I) obs: 0.108 / Net I/σ(I): 8.3
反射 シェル
解像度: 2.9→2.97 Å / Rmerge(I) obs: 0.278 / Mean I/σ(I) obs: 3.4 / % possible all: 96.6
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解析
ソフトウェア
名称
バージョン
分類
DNA
データ収集
PHASER
位相決定
REFMAC
5.5.0066
精密化
MOSFLM
データ削減
SCALA
データスケーリング
精密化
構造決定の手法: フーリエ合成 / 解像度: 2.9→120.86 Å / Cor.coef. Fo:Fc: 0.924 / Cor.coef. Fo:Fc free: 0.836 / SU B: 18.83 / SU ML: 0.361 / 交差検証法: THROUGHOUT / ESU R Free: 0.5 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.279
3837
5 %
RANDOM
Rwork
0.191
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obs
0.195
72733
97.9 %
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溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.4 Å / 溶媒モデル: MASK