THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH ...THE CONSTRUCT WAS EXPRESSED WITH A PURIFICATION TAG MGSDKIHHHHHHENLYFQG. THE TAG WAS REMOVED WITH TEV PROTEASE LEAVING ONLY A GLYCINE (0) FOLLOWED BY THE TARGET SEQUENCE.
解像度: 1.8→29.934 Å / Num. obs: 43986 / % possible obs: 99.6 % / Observed criterion σ(I): -3 / Biso Wilson estimate: 26.263 Å2 / Rmerge(I) obs: 0.058 / Net I/σ(I): 14.39
反射 シェル
解像度 (Å)
Rmerge(I) obs
Mean I/σ(I) obs
Num. measured obs
Num. unique obs
Diffraction-ID
% possible all
1.8-1.86
0.735
1.8
28937
7671
1
96.9
1.86-1.94
0.513
2.6
34925
9135
1
99.9
1.94-2.03
0.325
4.1
32923
8591
1
99.8
2.03-2.13
0.234
5.7
30424
7923
1
99.9
2.13-2.27
0.158
8.2
34187
8889
1
99.9
2.27-2.44
0.113
11.2
31655
8189
1
99.9
2.44-2.69
0.081
15.1
33314
8606
1
99.9
2.69-3.07
0.054
21.8
32155
8309
1
100
3.07-3.87
0.034
32.7
33179
8571
1
100
3.87-29.934
0.028
40
32936
8514
1
99.7
-
位相決定
位相決定
手法: 多波長異常分散
-
解析
ソフトウェア
名称
バージョン
分類
NB
REFMAC
5.5.0053
精密化
PHENIX
精密化
SOLVE
位相決定
MolProbity
3beta29
モデル構築
XSCALE
データスケーリング
PDB_EXTRACT
3.006
データ抽出
XDS
データ削減
精密化
構造決定の手法: 多波長異常分散 / 解像度: 1.8→29.934 Å / Cor.coef. Fo:Fc: 0.962 / Cor.coef. Fo:Fc free: 0.954 / Occupancy max: 1 / Occupancy min: 0.23 / SU B: 4.19 / SU ML: 0.06 / TLS residual ADP flag: LIKELY RESIDUAL / 交差検証法: THROUGHOUT / σ(F): 0 / ESU R: 0.1 / ESU R Free: 0.095 立体化学のターゲット値: MAXIMUM LIKELIHOOD WITH PHASES 詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE ...詳細: 1. HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS. 2. A MET-INHIBITION PROTOCOL WAS USED FOR SELENOMETHIONINE INCORPORATION DURING PROTEIN EXPRESSION. THE OCCUPANCY OF THE SE ATOMS IN THE MSE RESIDUES WAS REDUCED TO 0.75 FOR THE REDUCED SCATTERING POWER DUE TO PARTIAL S-MET INCORPORATION. 3. ATOM RECORDS CONTAIN RESIDUAL B FACTORS ONLY. 4. S-ADENOSYLMETHIONINE (SAM) WAS MODELED BASED ON STRUCTURAL HOMOLOGY AND DENSITY. THE SAM IN THE SECOND DIMER IS IS VERY WEAK AND NOT MODELLED 5. GLYCEROL AND NICKEL MODELED ARE PRESENT IN CRYSTALLIZATION CONDITIONS.
Rfactor
反射数
%反射
Selection details
Rfree
0.194
2213
5 %
RANDOM
Rwork
0.173
-
-
-
obs
0.174
43956
99.9 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK