Cyclic residues in alpha/beta-peptide helix bundles: GCN4-pLI side chain sequence on an (alpha-alpha-beta) backbone with a cyclic beta-residue at position 10
要素
alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10
キーワード
DE NOVO PROTEIN / helix bundle / foldamer / alpha/beta-peptide
A: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10 B: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10
A: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10 B: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10
A: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10 B: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10
A: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10 B: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10
A: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10 B: alpha/beta-peptide based on the GCN4-pLI side chain sequence with an (alpha-alpha-beta) backbone and a cyclic beta-residue at position 10
解像度: 2.1→24.33 Å / Cor.coef. Fo:Fc: 0.956 / Cor.coef. Fo:Fc free: 0.96 / SU B: 3.967 / SU ML: 0.107 / 交差検証法: THROUGHOUT / ESU R: 0.219 / ESU R Free: 0.184 / 立体化学のターゲット値: MAXIMUM LIKELIHOOD / 詳細: HYDROGENS HAVE BEEN ADDED IN THE RIDING POSITIONS
Rfactor
反射数
%反射
Selection details
Rfree
0.23369
215
4.6 %
RANDOM
Rwork
0.18899
-
-
-
obs
0.19117
4425
99.34 %
-
溶媒の処理
イオンプローブ半径: 0.8 Å / 減衰半径: 0.8 Å / VDWプローブ半径: 1.2 Å / 溶媒モデル: MASK